利用原子层沉积 (ALD) 技术依次沉积 Al2O3 纳米薄膜稳定不锈钢界面

{"title":"利用原子层沉积 (ALD) 技术依次沉积 Al2O3 纳米薄膜稳定不锈钢界面","authors":"Abhishek Sharma, Sudipa Manna, Prem Kumar Mishra, Surendra Singh, A. Satpati","doi":"10.1007/s44251-024-00050-9","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":510857,"journal":{"name":"Surface Science and Technology","volume":"32 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Stabilization of the stainless-steel interface using sequentially deposited Al2O3 nano films using atomic layer deposition (ALD) technique\",\"authors\":\"Abhishek Sharma, Sudipa Manna, Prem Kumar Mishra, Surendra Singh, A. Satpati\",\"doi\":\"10.1007/s44251-024-00050-9\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":510857,\"journal\":{\"name\":\"Surface Science and Technology\",\"volume\":\"32 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-07-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Surface Science and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1007/s44251-024-00050-9\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/s44251-024-00050-9","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}