钠和钾化合物作为在二氧化硅/硅衬底上生长高晶体质量单层 MoS2 的促进剂的比较研究

Jun Xiong, Qiang Wu, Xinwei Cai, Yiming Zhu, Guangyang Lin, Cheng Li
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摘要

单层 MoS2 具有直接带隙特性和高载流子迁移率,是制造光电器件的理想候选材料。碱金属化合物已被证明是在二氧化硅/硅衬底上生长大型单晶单层 MoS2 的有效促进剂。然而,碱金属化合物的催化机理仍存在争议。在此,我们比较了在含有钾或钠阳离子和卤素(氯)或非卤素(氢氧)阴离子(即 NaCl、NaOH、KCl 和 KOH)的促进剂的辅助下,在二氧化硅/硅衬底上生长的单层 MoS2 薄片的表面形貌、光学特性和电学特性。根据对现有生长机理的分析,我们提出碱金属阳离子在促进单层 MoS2 的横向生长和获得高质量晶体方面起主导作用。此外,钾的促进作用大于钠。通过优化生长条件,在氯化钾促进剂的帮助下,生长出了横向尺寸超过 160 微米的单层三角形 MoS2 薄片。拉曼光谱和聚光光谱验证了这些薄片极佳的晶体质量,在原生长基底和新的二氧化硅/硅基底上制造的背栅效应晶体管的典型电子迁移率分别为 2.98 和 20 cm2-V-1-s-1。
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Comparative study of sodium and potassium compounds as promoters for growth of monolayer MoS2 with high crystal quality on SiO2/Si substrate
Monolayer MoS2 is promising candidate for fabrication of optoelectronic devices due to its direct bandgap nature and high carrier mobility. Alkali metal compounds have been demonstrated to be helpful promoters for the growth of large single crystal monolayer MoS2 on SiO2/Si substrate. However, the catalytic mechanism of alkali metal compounds is still under debate. Herein, we compared the surface morphology, optical properties, and electrical properties of monolayer MoS2 flakes grown on SiO2/Si substrate assisted by promoters containing potassium or sodium cations and halogen (chlorine) or non-halogen (hydroxide) anions, i.e., NaCl, NaOH, KCl and KOH. Based on the analysis of existing growth mechanism, we proposed that the alkali metal cation, plays a dominant role in promoting the lateral growth of monolayer MoS2 and obtaining high crystal quality. Furthermore, potassium has a greater promoting effect than sodium. By optimizing growth conditions, monolayer triangular MoS2 flakes with large lateral size over 160 µm were grown assisted by KCl promoter. Raman and PL spectra verified excellent crystal quality of the flakes, with typical electron mobilities of 2.98 and 20 cm2·V-1·s-1 for the back-gated filed effect transistors fabricated on as-grown and fresh SiO2/Si substrates, respectively.
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