用 О+ 和 N+ 离子交替辐照对 Ti-Al-V 合金的成分、结构和电化学性质的影响

IF 1.1 4区 材料科学 Q3 METALLURGY & METALLURGICAL ENGINEERING Physics of Metals and Metallography Pub Date : 2024-07-17 DOI:10.1134/s0031918x24600052
V. L. Vorob’ev, V. S. Gladysheva, P. V. Bykov, S. G. Bystrov, I. N. Klimova, A. V. Syugaev, A. A. Kolotov, V. Ya. Bayankin
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引用次数: 0

摘要

摘要 研究了 Ti-Al-V 合金的化学成分、表面形貌和电化学性质,包括初始状态和用О+离子辐照后的状态,以及用О+离子和 N+离子交替辐照(N+离子的辐照剂量不同)后的状态。结果表明,在 О+ 离子的辐照下,钛原子发生了活性氧化,并伴随着钛氧化物和氢氧化物的形成。在随后使用 N+ 离子进行辐照的过程中,发现氮的积累和氮化钛 TiN 的形成的浓度低于未使用 О+ 离子进行初步辐照时观察到的浓度。据推测,这是由于与钛原子相比,氧的化学活性高于氮。
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Effect of Alternating Irradiation with О+ and N+ Ions on the Composition, Structure, and Electrochemical Properties of a Ti–Al–V Alloy

Abstract

The chemical composition, surface morphology, and electrochemical properties of Ti–Al–V alloys in the initial state and after irradiation with О+ ions and alternating irradiation with О+ and N+ ions differing in the irradiation dose of N+ ions are studied. Under irradiation with О+ ions, the active oxidation of Ti atoms is shown to occur, which is accompanied by the formation of titanium oxides and hydroxides. In the course of subsequent irradiation with N+ ions, the accumulation of nitrogen and formation of titanium nitride TiN are found to occur to lower concentrations as compared to those observed without the preliminary irradiation with О+ ions. It is assumed that this is due to the higher chemical activity of oxygen with respect to titanium atoms, as compared to that of nitrogen.

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来源期刊
Physics of Metals and Metallography
Physics of Metals and Metallography 工程技术-冶金工程
CiteScore
2.00
自引率
25.00%
发文量
108
审稿时长
3 months
期刊介绍: The Physics of Metals and Metallography (Fizika metallov i metallovedenie) was founded in 1955 by the USSR Academy of Sciences. Its scientific profile involves the theory of metals and metal alloys, their electrical and magnetic properties, as well as their structure, phase transformations, and principal mechanical properties. The journal also publishes scientific reviews and papers written by experts involved in fundamental, application, and technological studies. The annual volume of publications amounts to some 250 papers submitted from 100 leading national scientific institutions.
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