通过在氧气环境中退火的氧化铟钨和氧化锌工程异质结通道提高 TFT 的稳定性和迁移率

Nanomaterials Pub Date : 2024-07-26 DOI:10.3390/nano14151252
Seong-Hwan Lim, Dong-Gyun Mah, Won-Ju Cho
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引用次数: 0

摘要

这项研究表明,通过结合氧化铟钨(IWO)和氧化锌(ZnO),薄膜晶体管(TFT)在稳定性和迁移率方面的性能得到了显著提高。我们采用不同的沟道厚度比和退火环境制作了 IWO/ZnO 异质结结构。在氧气环境中退火的 IWO(5 nm)/ZnO(45 nm)TFT 显示出 26.28 cm2/V-s 的高迁移率,在 10 V 漏极电压下的最大漏极电流为 1.54 μA,优于单通道 ZnO TFT 的 3.8 cm2/V-s 和 28.08 nA。这种迁移率的提高归因于 IWO/ZnO 结处形成了势阱,导致电荷积累并改善了渗流传导。与单一氧化锌沟道相比,工程异质结沟道在正负栅极偏压应力下表现出更高的稳定性。O 1s 光谱分析显示出 OI、OII 和 OIII 峰,证实了理论机制。偏压温度应力测试表明,与单 ZnO 沟道相比,在 25、55 和 85 ℃ 温度条件下,电荷捕获时间特性更为出色。所提出的 IWO/ZnO 异质结沟道克服了单一 ZnO 沟道的局限性,为开发具有出色稳定性和更高迁移率的 TFT 器件提供了一种极具吸引力的方法。
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Enhancing the Stability and Mobility of TFTs via Indium–Tungsten Oxide and Zinc Oxide Engineered Heterojunction Channels Annealed in Oxygen Ambient
This study demonstrates a significant enhancement in the performance of thin-film transistors (TFTs) in terms of stability and mobility by combining indium–tungsten oxide (IWO) and zinc oxide (ZnO). IWO/ZnO heterojunction structures were fabricated with different channel thickness ratios and annealing environments. The IWO (5 nm)/ZnO (45 nm) TFT, annealed in O2 ambient, exhibited a high mobility of 26.28 cm2/V·s and a maximum drain current of 1.54 μA at a drain voltage of 10 V, outperforming the single-channel ZnO TFT, with values of 3.8 cm2/V·s and 28.08 nA. This mobility enhancement is attributed to the formation of potential wells at the IWO/ZnO junction, resulting in charge accumulation and improved percolation conduction. The engineered heterojunction channel demonstrated superior stability under positive and negative gate bias stresses compared to the single ZnO channel. The analysis of O 1s spectra showed OI, OII, and OIII peaks, confirming the theoretical mechanism. A bias temperature stress test revealed superior charge-trapping time characteristics at temperatures of 25, 55, and 85 °C compared with the single ZnO channel. The proposed IWO/ZnO heterojunction channel overcomes the limitations of the single ZnO channel and presents an attractive approach for developing TFT-based devices having excellent stability and enhanced mobility.
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