4H 碳化硅的进展与挑战:缺陷与杂质

Yanwei Yang, Zhouyu Tong, X. Pi, Deren Yang, Yuanchao Huang
{"title":"4H 碳化硅的进展与挑战:缺陷与杂质","authors":"Yanwei Yang, Zhouyu Tong, X. Pi, Deren Yang, Yuanchao Huang","doi":"10.1088/1402-4896/ad6697","DOIUrl":null,"url":null,"abstract":"\n Under the impetus of global carbon peak and carbon neutrality goals, a new generation of semiconductor material is urgently needed in various aspects of power electronic systems. In comparison to traditional semiconductor materials like single-crystal silicon, the outstanding characteristics of 4H silicon carbide (4H-SiC) have gradually positioned it as a crucial semiconductor material for emerging power semiconductor applications. Given the significance of impurities and defects in the semiconductor, comprehensive and in-depth understanding of impurities and defects about 4H-SiC plays a crucial guiding role. This paper, building upon a brief overview of the current state of 4H-SiC research, summarizes the experimental and theoretical advancements in the study of defects and impurities about 4H-SiC in recent years. Besides, we also systematically review the categories of defects in 4H-SiC, introduce methods for characterizing and identifying defects in 4H-SiC, and thoroughly discuss potential doping technologies in 4H-SiC. Challenges faced in the research of defects and impurities are finally outlined.","PeriodicalId":503429,"journal":{"name":"Physica Scripta","volume":"18 8","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-07-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Advances and challenges in 4H silicon carbide: defects and impurities\",\"authors\":\"Yanwei Yang, Zhouyu Tong, X. Pi, Deren Yang, Yuanchao Huang\",\"doi\":\"10.1088/1402-4896/ad6697\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\\n Under the impetus of global carbon peak and carbon neutrality goals, a new generation of semiconductor material is urgently needed in various aspects of power electronic systems. In comparison to traditional semiconductor materials like single-crystal silicon, the outstanding characteristics of 4H silicon carbide (4H-SiC) have gradually positioned it as a crucial semiconductor material for emerging power semiconductor applications. Given the significance of impurities and defects in the semiconductor, comprehensive and in-depth understanding of impurities and defects about 4H-SiC plays a crucial guiding role. This paper, building upon a brief overview of the current state of 4H-SiC research, summarizes the experimental and theoretical advancements in the study of defects and impurities about 4H-SiC in recent years. Besides, we also systematically review the categories of defects in 4H-SiC, introduce methods for characterizing and identifying defects in 4H-SiC, and thoroughly discuss potential doping technologies in 4H-SiC. Challenges faced in the research of defects and impurities are finally outlined.\",\"PeriodicalId\":503429,\"journal\":{\"name\":\"Physica Scripta\",\"volume\":\"18 8\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-07-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Physica Scripta\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/1402-4896/ad6697\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physica Scripta","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1402-4896/ad6697","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

在全球碳峰值和碳中和目标的推动下,电力电子系统的各个方面迫切需要新一代半导体材料。与单晶硅等传统半导体材料相比,4H-碳化硅(4H-SiC)的优异特性使其逐渐成为新兴功率半导体应用领域的关键半导体材料。鉴于杂质和缺陷在半导体中的重要性,全面深入地了解 4H-SiC 的杂质和缺陷具有重要的指导作用。本文在概述 4H-SiC 研究现状的基础上,总结了近年来 4H-SiC 缺陷和杂质研究的实验和理论进展。此外,我们还系统回顾了 4H-SiC 中缺陷的类别,介绍了表征和识别 4H-SiC 中缺陷的方法,并深入探讨了 4H-SiC 中潜在的掺杂技术。最后概述了缺陷和杂质研究中面临的挑战。
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Advances and challenges in 4H silicon carbide: defects and impurities
Under the impetus of global carbon peak and carbon neutrality goals, a new generation of semiconductor material is urgently needed in various aspects of power electronic systems. In comparison to traditional semiconductor materials like single-crystal silicon, the outstanding characteristics of 4H silicon carbide (4H-SiC) have gradually positioned it as a crucial semiconductor material for emerging power semiconductor applications. Given the significance of impurities and defects in the semiconductor, comprehensive and in-depth understanding of impurities and defects about 4H-SiC plays a crucial guiding role. This paper, building upon a brief overview of the current state of 4H-SiC research, summarizes the experimental and theoretical advancements in the study of defects and impurities about 4H-SiC in recent years. Besides, we also systematically review the categories of defects in 4H-SiC, introduce methods for characterizing and identifying defects in 4H-SiC, and thoroughly discuss potential doping technologies in 4H-SiC. Challenges faced in the research of defects and impurities are finally outlined.
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