关于用于高强度 X 射线的多层光学器件的热稳定性

IF 2.8 3区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Optical Materials Express Pub Date : 2024-06-24 DOI:10.1364/ome.527226
Margarita Zakharova, Zlatko Rek, Božidar Šarler, Saša Bajt
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引用次数: 0

摘要

高强度 X 射线自由电子激光器(XFEL)光束需要由辐射吸收最小、衍射效率高和辐射硬度高的材料制成的光学器件。多层劳厄透镜(MLL)是一种基于衍射的 X 射线光学器件,可以聚焦 XFEL 光束,基于碳化钨/碳化硅(WC/SiC)的多层劳厄透镜已经证明了这一点。然而,钨等高原子序数材料会强烈吸收 X 射线,从而导致高热负荷。数值模拟预测,由低原子序数 Z 材料组成的 MLL 的热负荷要低得多,尽管这种 MLL 的摇摆曲线宽度较窄。在本文中,我们首先筛选了各种候选多层材料,然后重点研究了具有高衍射效率的 Mo2C/SiC 多层材料。根据数值模拟,如果将该多层膜制成的 MLL 暴露在光子能量为 17.5 keV、每脉冲能量为 1 mJ、脉冲重复率为 10 kHz 的 XFEL 光束中,该多层膜的最高温度应保持在 300°C 以下。为了了解 Mo2C/SiC 多层的热稳定性,我们对三种不同周期(1.5、5 和 12 nm)和不同 Mo2C 与 SiC 比率的多层进行了研究。在两种不同的加热速率下,我们监测了它们的周期、结晶度和应力与退火温度的函数关系。本文介绍的结果表明,基于 Mo2C/SiC 的 MLL 可用于聚焦 XFEL 光束,而不会在这些条件下受到损坏。
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On the thermal stability of multilayer optics for use with high X-ray intensities
High-intensity X-ray free electron laser (XFEL) beams require optics made of materials with minimal radiation absorption, high diffraction efficiency, and high radiation hardness. Multilayer Laue lenses (MLLs) are diffraction-based X-ray optics that can focus XFEL beams, as already demonstrated with tungsten carbide/silicon carbide (WC/SiC)-based MLLs. However, high atomic number materials such as tungsten strongly absorb X-rays, resulting in high heat loads. Numerical simulations predict much lower heat loads in MLLs consisting of low atomic number Z materials, although such MLLs have narrower rocking curve widths. In this paper, we first screen various multilayer candidates and then focus on Mo2C/SiC multilayer due to its high diffraction efficiency. According to numerical simulations, the maximum temperature in this multilayer should remain below 300°C if the MLL made out of this multilayer is exposed to an XFEL beam of 17.5 keV photon energy, 1 mJ energy per pulse and 10 kHz pulse repetition rate. To understand the thermal stability of the Mo2C/SiC multilayer, we performed a study on the multilayers of three different periods (1.5, 5, and 12 nm) and different Mo2C to SiC ratios. We monitored their periods, crystallinity, and stress as a function of annealing temperature for two different heating rates. The results presented in this paper indicate that Mo2C/SiC-based MLLs are viable for focusing XFEL beams without being damaged under these conditions.
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来源期刊
Optical Materials Express
Optical Materials Express MATERIALS SCIENCE, MULTIDISCIPLINARY-OPTICS
CiteScore
5.50
自引率
3.60%
发文量
377
审稿时长
1.5 months
期刊介绍: The Optical Society (OSA) publishes high-quality, peer-reviewed articles in its portfolio of journals, which serve the full breadth of the optics and photonics community. Optical Materials Express (OMEx), OSA''s open-access, rapid-review journal, primarily emphasizes advances in both conventional and novel optical materials, their properties, theory and modeling, synthesis and fabrication approaches for optics and photonics; how such materials contribute to novel optical behavior; and how they enable new or improved optical devices. The journal covers a full range of topics, including, but not limited to: Artificially engineered optical structures Biomaterials Optical detector materials Optical storage media Materials for integrated optics Nonlinear optical materials Laser materials Metamaterials Nanomaterials Organics and polymers Soft materials IR materials Materials for fiber optics Hybrid technologies Materials for quantum photonics Optical Materials Express considers original research articles, feature issue contributions, invited reviews, and comments on published articles. The Journal also publishes occasional short, timely opinion articles from experts and thought-leaders in the field on current or emerging topic areas that are generating significant interest.
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