{"title":"关于用于高强度 X 射线的多层光学器件的热稳定性","authors":"Margarita Zakharova, Zlatko Rek, Božidar Šarler, Saša Bajt","doi":"10.1364/ome.527226","DOIUrl":null,"url":null,"abstract":"High-intensity X-ray free electron laser (XFEL) beams require optics made of materials with minimal radiation absorption, high diffraction efficiency, and high radiation hardness. Multilayer Laue lenses (MLLs) are diffraction-based X-ray optics that can focus XFEL beams, as already demonstrated with tungsten carbide/silicon carbide (WC/SiC)-based MLLs. However, high atomic number materials such as tungsten strongly absorb X-rays, resulting in high heat loads. Numerical simulations predict much lower heat loads in MLLs consisting of low atomic number Z materials, although such MLLs have narrower rocking curve widths. In this paper, we first screen various multilayer candidates and then focus on Mo<jats:sub>2</jats:sub>C/SiC multilayer due to its high diffraction efficiency. According to numerical simulations, the maximum temperature in this multilayer should remain below 300°C if the MLL made out of this multilayer is exposed to an XFEL beam of 17.5 keV photon energy, 1 mJ energy per pulse and 10 kHz pulse repetition rate. To understand the thermal stability of the Mo<jats:sub>2</jats:sub>C/SiC multilayer, we performed a study on the multilayers of three different periods (1.5, 5, and 12 nm) and different Mo<jats:sub>2</jats:sub>C to SiC ratios. We monitored their periods, crystallinity, and stress as a function of annealing temperature for two different heating rates. The results presented in this paper indicate that Mo<jats:sub>2</jats:sub>C/SiC-based MLLs are viable for focusing XFEL beams without being damaged under these conditions.","PeriodicalId":19548,"journal":{"name":"Optical Materials Express","volume":null,"pages":null},"PeriodicalIF":2.8000,"publicationDate":"2024-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"On the thermal stability of multilayer optics for use with high X-ray intensities\",\"authors\":\"Margarita Zakharova, Zlatko Rek, Božidar Šarler, Saša Bajt\",\"doi\":\"10.1364/ome.527226\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"High-intensity X-ray free electron laser (XFEL) beams require optics made of materials with minimal radiation absorption, high diffraction efficiency, and high radiation hardness. Multilayer Laue lenses (MLLs) are diffraction-based X-ray optics that can focus XFEL beams, as already demonstrated with tungsten carbide/silicon carbide (WC/SiC)-based MLLs. However, high atomic number materials such as tungsten strongly absorb X-rays, resulting in high heat loads. Numerical simulations predict much lower heat loads in MLLs consisting of low atomic number Z materials, although such MLLs have narrower rocking curve widths. In this paper, we first screen various multilayer candidates and then focus on Mo<jats:sub>2</jats:sub>C/SiC multilayer due to its high diffraction efficiency. According to numerical simulations, the maximum temperature in this multilayer should remain below 300°C if the MLL made out of this multilayer is exposed to an XFEL beam of 17.5 keV photon energy, 1 mJ energy per pulse and 10 kHz pulse repetition rate. To understand the thermal stability of the Mo<jats:sub>2</jats:sub>C/SiC multilayer, we performed a study on the multilayers of three different periods (1.5, 5, and 12 nm) and different Mo<jats:sub>2</jats:sub>C to SiC ratios. We monitored their periods, crystallinity, and stress as a function of annealing temperature for two different heating rates. The results presented in this paper indicate that Mo<jats:sub>2</jats:sub>C/SiC-based MLLs are viable for focusing XFEL beams without being damaged under these conditions.\",\"PeriodicalId\":19548,\"journal\":{\"name\":\"Optical Materials Express\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2024-06-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Materials Express\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1364/ome.527226\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Materials Express","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1364/ome.527226","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
摘要
高强度 X 射线自由电子激光器(XFEL)光束需要由辐射吸收最小、衍射效率高和辐射硬度高的材料制成的光学器件。多层劳厄透镜(MLL)是一种基于衍射的 X 射线光学器件,可以聚焦 XFEL 光束,基于碳化钨/碳化硅(WC/SiC)的多层劳厄透镜已经证明了这一点。然而,钨等高原子序数材料会强烈吸收 X 射线,从而导致高热负荷。数值模拟预测,由低原子序数 Z 材料组成的 MLL 的热负荷要低得多,尽管这种 MLL 的摇摆曲线宽度较窄。在本文中,我们首先筛选了各种候选多层材料,然后重点研究了具有高衍射效率的 Mo2C/SiC 多层材料。根据数值模拟,如果将该多层膜制成的 MLL 暴露在光子能量为 17.5 keV、每脉冲能量为 1 mJ、脉冲重复率为 10 kHz 的 XFEL 光束中,该多层膜的最高温度应保持在 300°C 以下。为了了解 Mo2C/SiC 多层的热稳定性,我们对三种不同周期(1.5、5 和 12 nm)和不同 Mo2C 与 SiC 比率的多层进行了研究。在两种不同的加热速率下,我们监测了它们的周期、结晶度和应力与退火温度的函数关系。本文介绍的结果表明,基于 Mo2C/SiC 的 MLL 可用于聚焦 XFEL 光束,而不会在这些条件下受到损坏。
On the thermal stability of multilayer optics for use with high X-ray intensities
High-intensity X-ray free electron laser (XFEL) beams require optics made of materials with minimal radiation absorption, high diffraction efficiency, and high radiation hardness. Multilayer Laue lenses (MLLs) are diffraction-based X-ray optics that can focus XFEL beams, as already demonstrated with tungsten carbide/silicon carbide (WC/SiC)-based MLLs. However, high atomic number materials such as tungsten strongly absorb X-rays, resulting in high heat loads. Numerical simulations predict much lower heat loads in MLLs consisting of low atomic number Z materials, although such MLLs have narrower rocking curve widths. In this paper, we first screen various multilayer candidates and then focus on Mo2C/SiC multilayer due to its high diffraction efficiency. According to numerical simulations, the maximum temperature in this multilayer should remain below 300°C if the MLL made out of this multilayer is exposed to an XFEL beam of 17.5 keV photon energy, 1 mJ energy per pulse and 10 kHz pulse repetition rate. To understand the thermal stability of the Mo2C/SiC multilayer, we performed a study on the multilayers of three different periods (1.5, 5, and 12 nm) and different Mo2C to SiC ratios. We monitored their periods, crystallinity, and stress as a function of annealing temperature for two different heating rates. The results presented in this paper indicate that Mo2C/SiC-based MLLs are viable for focusing XFEL beams without being damaged under these conditions.
期刊介绍:
The Optical Society (OSA) publishes high-quality, peer-reviewed articles in its portfolio of journals, which serve the full breadth of the optics and photonics community.
Optical Materials Express (OMEx), OSA''s open-access, rapid-review journal, primarily emphasizes advances in both conventional and novel optical materials, their properties, theory and modeling, synthesis and fabrication approaches for optics and photonics; how such materials contribute to novel optical behavior; and how they enable new or improved optical devices. The journal covers a full range of topics, including, but not limited to:
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Optical Materials Express considers original research articles, feature issue contributions, invited reviews, and comments on published articles. The Journal also publishes occasional short, timely opinion articles from experts and thought-leaders in the field on current or emerging topic areas that are generating significant interest.