铂、金、铜/n-InP 肖特基二极管中界面状态的特征和可能的电流传导机制研究

Hogyoung Kim
{"title":"铂、金、铜/n-InP 肖特基二极管中界面状态的特征和可能的电流传导机制研究","authors":"Hogyoung Kim","doi":"10.1088/1402-4896/ad6d1d","DOIUrl":null,"url":null,"abstract":"\n Based on the capacitance/conductance–voltage (C/G–V) and current–voltage (I–V) methods, the interface characteristics and the current conduction mechanisms of Pt/n-InP Schottky contacts were studied in detail. The interface states strongly affected the values of capacitance in the depletion region. From Terman, G–V, and forward I–V methods, the interface state density (Dit) was found to range from mid-1012 to mid-1013 eV-1cm-2. The forward current characteristics was not elucidated by the thermionic emission (TE) model assisted by tunneling via the interfacial layer. Rather, the spatially distributed inhomogeneous barrier could interpret the forward current characteristics. Trap-assisted tunneling involving phosphorous vacancy (VP)-related defects was observed to be dominant in the case of the reverse current characteristics. The comparison of Pt metal contact with Cu and Au contacts revealed that Pt contact has the highest Dit among three contacts.","PeriodicalId":503429,"journal":{"name":"Physica Scripta","volume":"57 26","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Characterization of interface states and investigation of possible current conduction mechanisms in the Pt, Au, Cu/n-InP Schottky diodes\",\"authors\":\"Hogyoung Kim\",\"doi\":\"10.1088/1402-4896/ad6d1d\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\\n Based on the capacitance/conductance–voltage (C/G–V) and current–voltage (I–V) methods, the interface characteristics and the current conduction mechanisms of Pt/n-InP Schottky contacts were studied in detail. The interface states strongly affected the values of capacitance in the depletion region. From Terman, G–V, and forward I–V methods, the interface state density (Dit) was found to range from mid-1012 to mid-1013 eV-1cm-2. The forward current characteristics was not elucidated by the thermionic emission (TE) model assisted by tunneling via the interfacial layer. Rather, the spatially distributed inhomogeneous barrier could interpret the forward current characteristics. Trap-assisted tunneling involving phosphorous vacancy (VP)-related defects was observed to be dominant in the case of the reverse current characteristics. The comparison of Pt metal contact with Cu and Au contacts revealed that Pt contact has the highest Dit among three contacts.\",\"PeriodicalId\":503429,\"journal\":{\"name\":\"Physica Scripta\",\"volume\":\"57 26\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-08-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Physica Scripta\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/1402-4896/ad6d1d\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physica Scripta","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1402-4896/ad6d1d","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

基于电容/电导-电压(C/G-V)和电流-电压(I-V)方法,详细研究了 Pt/n-InP 肖特基触点的界面特性和电流传导机制。界面状态对耗尽区的电容值有很大影响。通过特曼法、G-V 法和正向 I-V 法,发现界面态密度 (Dit) 在 1012 至 1013 eV-1cm-2 之间。热离子发射(TE)模型并没有阐明通过界面层进行隧道传输的正向电流特性。相反,空间分布的不均匀势垒可以解释正向电流特性。据观察,在反向电流特性中,涉及磷空位(VP)相关缺陷的陷阱辅助隧道效应占主导地位。将铂金属触点与铜和金触点进行比较后发现,在三种触点中,铂触点的 Dit 值最高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Characterization of interface states and investigation of possible current conduction mechanisms in the Pt, Au, Cu/n-InP Schottky diodes
Based on the capacitance/conductance–voltage (C/G–V) and current–voltage (I–V) methods, the interface characteristics and the current conduction mechanisms of Pt/n-InP Schottky contacts were studied in detail. The interface states strongly affected the values of capacitance in the depletion region. From Terman, G–V, and forward I–V methods, the interface state density (Dit) was found to range from mid-1012 to mid-1013 eV-1cm-2. The forward current characteristics was not elucidated by the thermionic emission (TE) model assisted by tunneling via the interfacial layer. Rather, the spatially distributed inhomogeneous barrier could interpret the forward current characteristics. Trap-assisted tunneling involving phosphorous vacancy (VP)-related defects was observed to be dominant in the case of the reverse current characteristics. The comparison of Pt metal contact with Cu and Au contacts revealed that Pt contact has the highest Dit among three contacts.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Design and Evaluation of β-Ga2O3 junction barrier Schottky diode with p-GaN Heterojunction Exact cosmological solutions of a Chaplygin Gas in Anisotropic Petrov Type D Spacetimes in Eddington-inspired-Born-Infeld gravity: Dark Energy Model Triple Band Self-Decoupled MIMO Antenna Pair for 5G Communication Optimizing Mechanical Behavior in Polymer Bio-Composites Reinforced with Basalt, Graphene, and PP-g-MA Position dependent mass dissipative scalar field at finite temperature
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1