设计具有灵活功率分配比和双极化独立光束转向功能的图案操纵面

IF 4.8 2区 计算机科学 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Antennas and Wireless Propagation Letters Pub Date : 2024-08-22 DOI:10.1109/LAWP.2024.3447690
De Yin;Lei Zhu;Bo Li;Jing-Xuan Zhou
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引用次数: 0

摘要

本文提出了一种新的平面反射面,它可以灵活地分配两个正交偏振面上的入射功率,并独立控制两个正交反射波的方向。该结构由方形贴片和微带线组成。通过微带线的不连续可以灵活地调整两个偏振的功率分配比,而通过改变传输线的长度可以独立地调整两个正交偏振反射波的方向到所需的角度。因此,所提出的模式操纵面(PMS)可以在一种入射下独立构建信号的两条传播路径,从而降低了成本和占用空间。为了验证所提出的设计理念,设计并制作了两个10 × 10单元的箱体。实测结果与仿真结果吻合较好,显示了未来无线通信的良好前景。
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Design of Pattern Manipulation Surface With Flexible Power Division Ratio and Independent Beam Steering of Two Polarizations
A novel planar reflective surface is proposed in this letter that can flexibly allocate the incident power on two orthogonal polarizations and independently control the directions of the two orthogonal reflected waves. The structure is composed of a square patch and a microstrip line. The power division ratio (PDR) of the two polarizations can be flexibly adjusted by the discontinuities of the microstrip line, while the directions of the two orthogonal polarized reflected waves can be independently adjusted to the desired angles by varying the length of the transmission line. Thus, the proposed pattern manipulation surface (PMS) can independently build two propagating paths of the signal under one kind of incidence, which reduces the cost and the occupied space. To validate the proposed design concept, two cases with 10 × 10 elements are designed and fabricated. The measured results agree well with the simulated ones, demonstrating a promising prospect for future wireless communications.
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来源期刊
CiteScore
8.00
自引率
9.50%
发文量
529
审稿时长
1.0 months
期刊介绍: IEEE Antennas and Wireless Propagation Letters (AWP Letters) is devoted to the rapid electronic publication of short manuscripts in the technical areas of Antennas and Wireless Propagation. These are areas of competence for the IEEE Antennas and Propagation Society (AP-S). AWPL aims to be one of the "fastest" journals among IEEE publications. This means that for papers that are eventually accepted, it is intended that an author may expect his or her paper to appear in IEEE Xplore, on average, around two months after submission.
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