在增材制造中通过激光诱导等离子体冲击波精确去除通孔中的微颗粒

IF 6.1 1区 工程技术 Q1 ENGINEERING, MANUFACTURING Journal of Manufacturing Processes Pub Date : 2024-09-18 DOI:10.1016/j.jmapro.2024.09.046
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引用次数: 0

摘要

本研究介绍了一种新型激光诱导等离子体(LIP)技术,用于非接触式快速清除快速成型制造(AM)部件通孔中的纳米和微颗粒。这种方法对于医疗设备、紧凑型热交换器和航空航天工程等高价值应用至关重要,因为这些应用需要高效清洁带有孔和通道的复杂零件,以解决故障成本高的问题。该技术利用 LIP 产生的冲击波来瞄准和清洁这些复杂的几何形状。研究主要集中在两个方面:(i) 描述冲击波在半圆柱形通道中的影响,以了解与复杂几何形状之间的相互作用;(ii) 定量分析硅(Si)晶片半圆柱形通道中铁-271 微颗粒的清除情况,与 AM 生产表面的粗糙纹理相比,硅(Si)晶片半圆柱形通道具有一致的表面特性。利用用于增材制造的激光诱导等离子体 LIP 清洁(LIPCAM)实验装置,该研究证明,使用可变激光脉冲,可在距离等离子体源 20 毫米的范围内实现微颗粒的完全清除。结果表明,大于 27 μm 的微粒在一个脉冲后即可完全清除,大于 21 μm 的微粒在 50 个脉冲后即可清除。这些发现凸显了该方法在不同距离和颗粒大小的情况下实现高颗粒去除效率的有效性,从而确保彻底清除复杂内部结构的污染。这项研究强调了这种方法在提高关键 AM 制造的可靠性和安全性方面的潜力,使其成为对精度和清洁度要求极高的行业的可行解决方案。
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Precision micro-particle removal from through-holes via laser-induced plasma shockwaves in additive manufacturing

This study introduces a novel Laser-Induced Plasma (LIP) technique for the non-contact, rapid removal of nano and microparticles from through-holes in Additive Manufacturing (AM) components. This method is crucial for high-value applications, such as medical devices, compact heat exchangers, and aerospace engineering, which require efficient cleaning of intricate parts with holes and channels to address high failure costs. The technique leverages shockwaves generated by LIP to target and clean these complex geometries. The research focuses on two main areas: (i) characterizing the effects of shockwaves in semi-cylindrical channels to understand interactions with complex geometries, and (ii) quantitatively analyzing the removal of Fe-271 microparticles from semi-cylindrical channels of silicon (Si) wafers, selected for their consistent surface properties compared to the rough textures of AM-produced surfaces. Utilizing the experimental set-up Laser-Induced Plasma LIP Cleaning for Additive Manufacturing (LIPCAM), the study demonstrates that complete microparticle removal is achievable up to 20 mm from the plasma source with variable laser pulses. The results indicate that particles larger than 27 μm are entirely removed after a single pulse, and particles larger than 21 μm are removed after 50 pulses. These findings highlight the method's effectiveness in achieving high particle removal efficiency across different distances and particle sizes, thus ensuring thorough decontamination of complex internal structures. The study underscores the potential of this method to enhance the reliability and safety of critical AM builds, making it a viable solution for industries where precision and cleanliness are paramount.

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来源期刊
Journal of Manufacturing Processes
Journal of Manufacturing Processes ENGINEERING, MANUFACTURING-
CiteScore
10.20
自引率
11.30%
发文量
833
审稿时长
50 days
期刊介绍: The aim of the Journal of Manufacturing Processes (JMP) is to exchange current and future directions of manufacturing processes research, development and implementation, and to publish archival scholarly literature with a view to advancing state-of-the-art manufacturing processes and encouraging innovation for developing new and efficient processes. The journal will also publish from other research communities for rapid communication of innovative new concepts. Special-topic issues on emerging technologies and invited papers will also be published.
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