Samanvitha Sridhar, Ario Khansari, Shaun O’Donnell, Alexandra T. Barth, Evgeny O. Danilov, Felix N. Castellano, Paul A. Maggard, Daniel B. Dougherty
{"title":"块状 CrCl3 中的配体场激子湮灭","authors":"Samanvitha Sridhar, Ario Khansari, Shaun O’Donnell, Alexandra T. Barth, Evgeny O. Danilov, Felix N. Castellano, Paul A. Maggard, Daniel B. Dougherty","doi":"10.1063/5.0223772","DOIUrl":null,"url":null,"abstract":"The layered van der Waals material CrCl3 exhibits very strongly bound ligand field excitons that control optoelectronic applications and are connected with magnetic ordering by virtue of their d-orbital origin. Time-resolved photoluminescence of these exciton populations at room temperature shows that their relaxation is dominated by exciton–exciton annihilation and that the spontaneous decay lifetime is very long. These observations allow the rough quantification of the exciton annihilation rate constant and contextualization in light of a recent theory of universal scaling behavior of the annihilation process.","PeriodicalId":501648,"journal":{"name":"The Journal of Chemical Physics","volume":"17 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Ligand field exciton annihilation in bulk CrCl3\",\"authors\":\"Samanvitha Sridhar, Ario Khansari, Shaun O’Donnell, Alexandra T. Barth, Evgeny O. Danilov, Felix N. Castellano, Paul A. Maggard, Daniel B. Dougherty\",\"doi\":\"10.1063/5.0223772\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The layered van der Waals material CrCl3 exhibits very strongly bound ligand field excitons that control optoelectronic applications and are connected with magnetic ordering by virtue of their d-orbital origin. Time-resolved photoluminescence of these exciton populations at room temperature shows that their relaxation is dominated by exciton–exciton annihilation and that the spontaneous decay lifetime is very long. These observations allow the rough quantification of the exciton annihilation rate constant and contextualization in light of a recent theory of universal scaling behavior of the annihilation process.\",\"PeriodicalId\":501648,\"journal\":{\"name\":\"The Journal of Chemical Physics\",\"volume\":\"17 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-09-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"The Journal of Chemical Physics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1063/5.0223772\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Journal of Chemical Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/5.0223772","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
摘要
层状范德瓦尔斯材料 CrCl3 显示出非常强的配体场激子束缚,这些激子控制着光电应用,并因其 d 轨道起源而与磁有序性相关联。这些激子群在室温下的时间分辨光致发光表明,它们的弛豫以激子-激子湮灭为主,自发衰变寿命很长。通过这些观察结果,我们可以粗略地量化激子湮灭率常数,并根据湮灭过程的普遍缩放行为的最新理论进行背景分析。
The layered van der Waals material CrCl3 exhibits very strongly bound ligand field excitons that control optoelectronic applications and are connected with magnetic ordering by virtue of their d-orbital origin. Time-resolved photoluminescence of these exciton populations at room temperature shows that their relaxation is dominated by exciton–exciton annihilation and that the spontaneous decay lifetime is very long. These observations allow the rough quantification of the exciton annihilation rate constant and contextualization in light of a recent theory of universal scaling behavior of the annihilation process.