{"title":"InP HEMT 噪声参数的改进表达式","authors":"Yuanting Lyu, Zhichun Li, Ao Zhang, Jianjun Gao","doi":"10.1002/mop.34320","DOIUrl":null,"url":null,"abstract":"<p>In this article, we propose a set of new expressions of four noise parameters for InP high electron mobility transistor (HEMT) devices based on PRC noise equivalent circuit model. The effects of gate-to-drain capacitance, drain-to-source conductance as well as extrinsic resistances have been taken into account. High consistency between measured and modeled noise parameters for 70 nm HEMT with 2 × 30 μm gate width in the frequency range 8–50 GHz are given by the expressions. Great usability is demonstrated for determination of small signal and noise model parameters extraction.</p>","PeriodicalId":18562,"journal":{"name":"Microwave and Optical Technology Letters","volume":"66 9","pages":""},"PeriodicalIF":1.0000,"publicationDate":"2024-09-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Improved expressions of noise parameters for InP HEMTs\",\"authors\":\"Yuanting Lyu, Zhichun Li, Ao Zhang, Jianjun Gao\",\"doi\":\"10.1002/mop.34320\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>In this article, we propose a set of new expressions of four noise parameters for InP high electron mobility transistor (HEMT) devices based on PRC noise equivalent circuit model. The effects of gate-to-drain capacitance, drain-to-source conductance as well as extrinsic resistances have been taken into account. High consistency between measured and modeled noise parameters for 70 nm HEMT with 2 × 30 μm gate width in the frequency range 8–50 GHz are given by the expressions. Great usability is demonstrated for determination of small signal and noise model parameters extraction.</p>\",\"PeriodicalId\":18562,\"journal\":{\"name\":\"Microwave and Optical Technology Letters\",\"volume\":\"66 9\",\"pages\":\"\"},\"PeriodicalIF\":1.0000,\"publicationDate\":\"2024-09-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Microwave and Optical Technology Letters\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/mop.34320\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microwave and Optical Technology Letters","FirstCategoryId":"5","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/mop.34320","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Improved expressions of noise parameters for InP HEMTs
In this article, we propose a set of new expressions of four noise parameters for InP high electron mobility transistor (HEMT) devices based on PRC noise equivalent circuit model. The effects of gate-to-drain capacitance, drain-to-source conductance as well as extrinsic resistances have been taken into account. High consistency between measured and modeled noise parameters for 70 nm HEMT with 2 × 30 μm gate width in the frequency range 8–50 GHz are given by the expressions. Great usability is demonstrated for determination of small signal and noise model parameters extraction.
期刊介绍:
Microwave and Optical Technology Letters provides quick publication (3 to 6 month turnaround) of the most recent findings and achievements in high frequency technology, from RF to optical spectrum. The journal publishes original short papers and letters on theoretical, applied, and system results in the following areas.
- RF, Microwave, and Millimeter Waves
- Antennas and Propagation
- Submillimeter-Wave and Infrared Technology
- Optical Engineering
All papers are subject to peer review before publication