{"title":"Ho 薄膜中的热滞后--实验结果与建模","authors":"A.A. Gurgel , F.G. Queiroz , E.S.N. Silva , D.H.A.L. Anselmo , V.D. Mello , V.V. Proglyado , M.A. Milyaev , E.A. Kravtsov , D.I. Devyaterikov , E.A. Stepanova , V.D. Zhaketov , F.A. Shelkovyi , E.M. Smelova , K.M. Tsysar , R.R. Gimaev , V.I. Zverev","doi":"10.1016/j.jmmm.2024.172579","DOIUrl":null,"url":null,"abstract":"<div><div>This paper presents the results of theoretical modeling and experimental studies of thermal hysteresis in holmium (Ho) thin films with a thickness of 200 nm at applied magnetic fields of 100 Oe, 1 kOe, and 10 kOe. The isofield magnetization curves, measured at 100 Oe and 1 kOe do not exhibit hysteresis during the heating and cooling processes. In contrast, M(T) measured at 10 kOe shows significant differences between the heating and cooling processes. The thermal hysteresis width covers almost the entire range between the Curie temperature (T<sub>C</sub>) and Néel temperature (T<sub>N</sub>) and is controlled by the external magnetic field. The peculiarities of the magnetic phase diagram of thin films in comparison with the bulk samples of Ho are also discussed.</div></div>","PeriodicalId":366,"journal":{"name":"Journal of Magnetism and Magnetic Materials","volume":"610 ","pages":"Article 172579"},"PeriodicalIF":2.5000,"publicationDate":"2024-10-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Thermal hysteresis in Ho thin films − experimental results and modeling\",\"authors\":\"A.A. Gurgel , F.G. Queiroz , E.S.N. Silva , D.H.A.L. Anselmo , V.D. Mello , V.V. Proglyado , M.A. Milyaev , E.A. Kravtsov , D.I. Devyaterikov , E.A. Stepanova , V.D. Zhaketov , F.A. Shelkovyi , E.M. Smelova , K.M. Tsysar , R.R. Gimaev , V.I. Zverev\",\"doi\":\"10.1016/j.jmmm.2024.172579\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This paper presents the results of theoretical modeling and experimental studies of thermal hysteresis in holmium (Ho) thin films with a thickness of 200 nm at applied magnetic fields of 100 Oe, 1 kOe, and 10 kOe. The isofield magnetization curves, measured at 100 Oe and 1 kOe do not exhibit hysteresis during the heating and cooling processes. In contrast, M(T) measured at 10 kOe shows significant differences between the heating and cooling processes. The thermal hysteresis width covers almost the entire range between the Curie temperature (T<sub>C</sub>) and Néel temperature (T<sub>N</sub>) and is controlled by the external magnetic field. The peculiarities of the magnetic phase diagram of thin films in comparison with the bulk samples of Ho are also discussed.</div></div>\",\"PeriodicalId\":366,\"journal\":{\"name\":\"Journal of Magnetism and Magnetic Materials\",\"volume\":\"610 \",\"pages\":\"Article 172579\"},\"PeriodicalIF\":2.5000,\"publicationDate\":\"2024-10-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Magnetism and Magnetic Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0304885324008709\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Magnetism and Magnetic Materials","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0304885324008709","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
摘要
本文介绍了厚度为 200 nm 的钬(Ho)薄膜在 100 Oe、1 kOe 和 10 kOe 的外加磁场下的热滞后理论建模和实验研究结果。在 100 Oe 和 1 kOe 下测量的等场磁化曲线在加热和冷却过程中没有表现出磁滞现象。相比之下,在 10 kOe 条件下测量的 M(T) 在加热和冷却过程中显示出显著差异。热滞后宽度几乎涵盖居里温度(TC)和奈尔温度(TN)之间的整个范围,并受外部磁场控制。此外,还讨论了与块状 Ho 样品相比,薄膜磁相图的特殊性。
Thermal hysteresis in Ho thin films − experimental results and modeling
This paper presents the results of theoretical modeling and experimental studies of thermal hysteresis in holmium (Ho) thin films with a thickness of 200 nm at applied magnetic fields of 100 Oe, 1 kOe, and 10 kOe. The isofield magnetization curves, measured at 100 Oe and 1 kOe do not exhibit hysteresis during the heating and cooling processes. In contrast, M(T) measured at 10 kOe shows significant differences between the heating and cooling processes. The thermal hysteresis width covers almost the entire range between the Curie temperature (TC) and Néel temperature (TN) and is controlled by the external magnetic field. The peculiarities of the magnetic phase diagram of thin films in comparison with the bulk samples of Ho are also discussed.
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