Janus M2XS2Se2(M = V、Ti;X = W、Mo)单层中的多级手性边缘态,具有高居里温度和可观的非对偶拓扑隙缝

IF 2.9 3区 化学 Q3 CHEMISTRY, PHYSICAL Physical Chemistry Chemical Physics Pub Date : 2024-10-22 DOI:10.1039/D4CP03325F
Li Deng, Xiang Yin, Yanzhao Wu, Junwei Tong, Gaowu Qin and Xianmin Zhang
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引用次数: 0

摘要

具有无耗散手性边缘通道的量子反常霍尔(QAH)绝缘体为拓扑材料和低功耗自旋电子器件的探索提供了理想的平台。然而,超低的工作温度和较小的非对偶间隙是 QAH 绝缘体走向未来应用的瓶颈。在此,我们提出了一个新的 QAH 绝缘体系列,即 Janus M2XS2Se2(M = V、Ti;X = W、Mo)单层,它是具有大垂直磁各向异性(PMA)和高于室温居里温度的铁磁体。此外,目前的 M2XS2Se2 单层具有相当大的非难拓扑间隙,从而产生了第一手性边缘态,其切尔数为 C=-1。出乎意料的是,在费米级以下还存在一个被占据的第 2 手性边缘态。虽然所有 M2XS2Se2 单层在施加双轴应变时都保持了 PMA 的特征,但也存在各种拓扑相变。V2WS2Se2 单层在任何应变下都保持了 QAH 状态,而 V2MoS2Se2 和 Ti2WS2Se2 单层在拉伸应变下则从 QAH 状态转变为金属状态。目前的 M2XS2Se2 单层在已报道的拓扑电子器件开发材料中显示出了竞争优势。
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Multi-level chiral edge states in Janus M2XS2Se2 (M = V, Ti; X = W, Mo) monolayers with high Curie temperature and sizable nontrivial topological gaps†

Quantum anomalous Hall (QAH) insulators with dissipation-less chiral edge channels provide ideal platforms for the exploration of topological materials and low-power spintronic devices. However, the ultralow operation temperature and small nontrivial gaps are the bottlenecks for QAH insulators towards future applications. Here, a new family of QAH insulators, that is, Janus M2XS2Se2 (M = V, Ti; X = W, Mo) monolayers, are proposed to be ferromagnets with large perpendicular magnetic anisotropy (PMA) and high Curie temperature above room temperature. Moreover, the present M2XS2Se2 monolayers hold sizable nontrivial topological gaps, resulting in the 1st chiral edge state with Chern number C = −1. Unexpectedly, there also exists an occupied 2nd chiral edge state below the Fermi level. Although all M2XS2Se2 monolayers retain their PMA characteristics on application of biaxial strain, various topological phase transitions are present. The V2WS2Se2 monolayer preserves the QAH state regardless of strain, while the V2MoS2Se2 and Ti2WS2Se2 monolayers transform from QAH states to metallic states under tensile strains. The present M2XS2Se2 monolayers show competitive advantages among the reported materials for the development of topological electronic devices.

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来源期刊
Physical Chemistry Chemical Physics
Physical Chemistry Chemical Physics 化学-物理:原子、分子和化学物理
CiteScore
5.50
自引率
9.10%
发文量
2675
审稿时长
2.0 months
期刊介绍: Physical Chemistry Chemical Physics (PCCP) is an international journal co-owned by 19 physical chemistry and physics societies from around the world. This journal publishes original, cutting-edge research in physical chemistry, chemical physics and biophysical chemistry. To be suitable for publication in PCCP, articles must include significant innovation and/or insight into physical chemistry; this is the most important criterion that reviewers and Editors will judge against when evaluating submissions. The journal has a broad scope and welcomes contributions spanning experiment, theory, computation and data science. Topical coverage includes spectroscopy, dynamics, kinetics, statistical mechanics, thermodynamics, electrochemistry, catalysis, surface science, quantum mechanics, quantum computing and machine learning. Interdisciplinary research areas such as polymers and soft matter, materials, nanoscience, energy, surfaces/interfaces, and biophysical chemistry are welcomed if they demonstrate significant innovation and/or insight into physical chemistry. Joined experimental/theoretical studies are particularly appreciated when complementary and based on up-to-date approaches.
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