CuO 和 g-C3N4 协同促进过氧化氢的光合作用†。

IF 2.6 3区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY CrystEngComm Pub Date : 2024-10-07 DOI:10.1039/D4CE00834K
Yuqing Pang, Yan Tian, Peng Zheng, Ke Feng, Jie Mao, Yujun Zhu, Kai Huang, Fei Ke and Chunyan Zhang
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引用次数: 0

摘要

氮化碳是一种很有前途的光催化剂,可在可见光照射下产生过氧化氢(H2O2)。然而,由于阻抗高和电荷转移能力差,目前的氮化碳基光催化剂产生 H2O2 的能力有限。在这项工作中,我们提出了一系列 CuO 装饰的石墨相氮化碳(g-C3N4)复合材料,它们在光催化生产 H2O2 方面表现出合适的带隙。实验结果表明,CuO/g-C3N4 复合材料具有优异的光催化产生 H2O2 性能和良好的光催化循环稳定性。值得注意的是,在可见光下,加入 CH3OH 后,优化的 30%-CuO/g-C3N4 复合材料的 H2O2 产率高达 2722.47 μmol L-1。此外,密度泛函理论计算对光催化机理进行了深入研究。这项研究表明,CuO/g-C3N4 复合材料在光催化产生 H2O2 方面具有广阔的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Synergy of CuO and g-C3N4 for boosting hydrogen peroxide photosynthesis†

Carbon nitride is a promising photocatalyst for hydrogen peroxide (H2O2) production under visible light irradiation. However, current carbon nitride-based photocatalysts show limited H2O2 production owing to high impedance and poor charge transfer ability. In this work, we present a series of CuO decorated graphitic phase carbon nitride (g-C3N4) composites, exhibiting suitable bandgaps for the photocatalytic production of H2O2. The experimental results showed that CuO/g-C3N4 composites exhibited excellent photocatalytic H2O2 production performance and good photocatalytic cycle stability. Significantly, the optimized 30%-CuO/g-C3N4 composite exhibits a high H2O2 yield of 2722.47 μmol L−1 with the addition of CH3OH under visible light. Furthermore, the photocatalytic mechanism is well studied by density functional theory calculations. This work demonstrates that CuO/g-C3N4 composites hold great promise for photocatalytic H2O2 production application.

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来源期刊
CrystEngComm
CrystEngComm 化学-化学综合
CiteScore
5.50
自引率
9.70%
发文量
747
审稿时长
1.7 months
期刊介绍: Design and understanding of solid-state and crystalline materials
期刊最新文献
Back cover Back cover Back cover Synthesis of 3D composite materials based on ultrathin LDH nanowalls grown in situ on graphene surface and fast-response NO2 gas sensing performance at room temperature† Variations in crystals of flufenamic acid of its methyl and tert-butyl analogues as impurities as determined by partial dissolutions†
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