Mikuláš Matoušek*, Nam Vu, Niranjan Govind, Jonathan J. Foley IV* and Libor Veis*,
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引用次数: 0
摘要
新兴的极性化学领域探索分子在空腔模式强耦合下的行为。尽管模拟电子强耦合下极性化学的 ab initio 极性方法取得了最新发展,但其能力仍然有限,尤其是在分子还具有强电子相关性的情况下。为了弥补这一差距,我们开发了一种新的空腔 QED 计算方法,利用密度矩阵重正化组(DMRG)算法和保利-菲尔兹哈密顿方程。我们采用这种方法研究了空穴对 n-oligoacenes 的 S0-S1 转变的影响,n 从 2 到 5 不等,在最大的并五苯分子中包含 22 个完全相关的 π 轨道。我们的研究结果表明,空腔的影响随着烯的增大而增强。此外,我们还证明,与完全行列式表示法不同,DMRG 可以有效地优化和消除多余的光子自由度,从而使计算成本随着光子基础的增加而逐渐不变。
Polaritonic Chemistry Using the Density Matrix Renormalization Group Method
The emerging field of polaritonic chemistry explores the behavior of molecules under strong coupling with cavity modes. Despite recent developments in ab initio polaritonic methods for simulating polaritonic chemistry under electronic strong coupling, their capabilities are limited, especially in cases where the molecule also features strong electronic correlation. To bridge this gap, we have developed a novel method for cavity QED calculations utilizing the Density Matrix Renormalization Group (DMRG) algorithm in conjunction with the Pauli–Fierz Hamiltonian. Our approach is applied to investigate the effect of the cavity on the S0–S1 transition of n-oligoacenes, with n ranging from 2 to 5, encompassing 22 fully correlated π orbitals in the largest pentacene molecule. Our findings indicate that the influence of the cavity intensifies with larger acenes. Additionally, we demonstrate that, unlike the full determinantal representation, DMRG efficiently optimizes and eliminates excess photonic degrees of freedom, resulting in an asymptotically constant computational cost as the photonic basis increases.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.