Elliot Kisiel, Ishwor Poudyal, Peter Kenesei, Mark Engbretson, Arndt Last, Rourav Basak, Ivan Zaluzhnyy, Uday Goteti, Robert Dynes, Antonino Miceli, Alex Frano, Zahir Islam
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引用次数: 0
摘要
X 射线科学的最新发展提供了利用暗场 X 射线显微镜(DFXM)探测深度嵌入的中尺度晶粒结构并对其进行空间分辨的方法。由于现有的探测方法和样品的入射 X 射线通量,将这种技术扩展到磁性系统、量子材料和薄膜等弱衍射信号的研究具有挑战性。我们介绍了与 KAImaging 联合开发的直接检测方法,该方法侧重于 10s of keV 及以上硬 X 射线范围内的 DFXM 研究,能够接近纳米级分辨率。此外,我们还将这种直接检测方案与常规使用的基于闪烁体的光学检测方案进行了比较,发现曝光时间缩短了一个数量级,从而可以对弱衍射有序系统进行成像。
Direct detection system for full-field nanoscale X-ray diffraction-contrast imaging.
Recent developments in X-ray science provide methods to probe deeply embedded mesoscale grain structures and spatially resolve them using dark field X-ray microscopy (DFXM). Extending this technique to investigate weak diffraction signals such as magnetic systems, quantum materials and thin films prove challenging due to available detection methods and incident X-ray flux at the sample. We present a direct detection method developed in conjunction with KAImaging which focuses on DFXM studies in the hard X-ray range of 10s of keV and above capable of approaching nanoscale resolution. Additionally, we compare this direct detection scheme with routinely used scintillator-based optical detection and achieve an order of magnitude improvement in exposure times allowing for imaging of weakly diffracting ordered systems.
期刊介绍:
Optics Express is the all-electronic, open access journal for optics providing rapid publication for peer-reviewed articles that emphasize scientific and technology innovations in all aspects of optics and photonics.