用于制造碳化硅陶瓷微结构的涂层辅助皮秒激光烧蚀。

IF 3.2 2区 物理与天体物理 Q2 OPTICS Optics express Pub Date : 2024-07-15 DOI:10.1364/OE.521035
Si Wu, Xiaohui Su, Yaqing Qiao, Le Liu, ZiJing Yang, Wei Xiong, Qiaodan Chen, Leimin Deng
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引用次数: 0

摘要

碳化硅(SiC)陶瓷已成为生产高精度部件的关键材料。超快激光加工被认为是碳化硅微纳制造的最佳技术。然而,激光烧蚀引起的永久沉积层会严重影响部件的精度。在这项工作中,提出了一种涂层辅助皮秒激光烧蚀(CAPLA)方法,利用牺牲型光刻胶涂层在不损失效率的情况下提高表面质量。涂层的作用是防止未冷却的等离子体与基底接触,从而防止形成永久沉积层。通过比较 CAPLA 法和激光直接烧蚀法,系统地研究了激光参数和光刻胶涂层特性对沉积层的影响。通过低脉冲能量和高扫描次数的 CAPLA,可实现无沉积层的加工表面。均匀性对于确保激光束的传输至关重要,而较大的厚度可通过增加脉冲能量容量的限制来提高加工效率。为了证明 CAPLA 方法的优越性,我们制作了用于 SiC 陶瓷真空吸盘的针阵列和真空槽。这些结果表明,这种方法是制造高精度部件的一种新颖而有前途的方法。
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Coating-assisted picosecond laser ablation for microstructure fabrication of SiC ceramics.

Silicon carbide (SiC) ceramics have emerged as critical materials in the production of high-precision components. Ultrafast laser processing is deemed the optimal technique for micro-nano manufacturing of SiC. However, the permanent deposition layer induced by laser ablation can critically impact the precision of the component. In this work, a coating-assisted picosecond laser ablation (CAPLA) method was proposed, in which sacrificial photoresist coating was utilized to improve surface quality without efficiency loss. The coating serves to prevent the uncooled plasma from contacting with the substrate, thereby preventing the formation of a permanent deposition layer. By comparing the CAPLA method with laser direct ablation, the influence of laser parameters and photoresist coating characteristics on the deposition layer was investigated systematically. A processed surface devoid of deposition layers can be achieved by CAPLA with low pulse energy and a high number of scans. The uniformity is critical to ensure the transmission of the laser beam, and a larger thickness can improve the processing efficiency by increasing the limit of pulse energy capacity. Pin arrays and vacuum grooves for SiC ceramic vacuum chucks were fabricated to demonstrate the superiority of the CAPLA method. These results suggest that this method can be a novel and promising approach for high-precision component manufacturing.

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来源期刊
Optics express
Optics express 物理-光学
CiteScore
6.60
自引率
15.80%
发文量
5182
审稿时长
2.1 months
期刊介绍: Optics Express is the all-electronic, open access journal for optics providing rapid publication for peer-reviewed articles that emphasize scientific and technology innovations in all aspects of optics and photonics.
期刊最新文献
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