考虑热负荷的高能x射线单色仪弯曲劳厄晶体的模拟

IF 2.8 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY Journal of Applied Crystallography Pub Date : 2025-01-24 DOI:10.1107/S1600576724011841
Jiayi Wang, Lidan Gao, Ming Li, Yiming Yang, Yanchun Li, Hu Cheng, Longlong Fan, Youkang Wang, Huilong Guo, Quanjie Jia
{"title":"考虑热负荷的高能x射线单色仪弯曲劳厄晶体的模拟","authors":"Jiayi Wang,&nbsp;Lidan Gao,&nbsp;Ming Li,&nbsp;Yiming Yang,&nbsp;Yanchun Li,&nbsp;Hu Cheng,&nbsp;Longlong Fan,&nbsp;Youkang Wang,&nbsp;Huilong Guo,&nbsp;Quanjie Jia","doi":"10.1107/S1600576724011841","DOIUrl":null,"url":null,"abstract":"<p>The performance of a double-crystal Laue-case monochromator has been evaluated for the Engineering Material beamline at the High Energy Photon Source. Expanding on the <i>xrt</i> framework, the crystal simulation incorporates the Penning–Polder and multilamellar models to determine the crystal diffraction profiles and utilizes two approaches, analytical expression and discrete point, for crystal depiction. The simulation accounts for the heat load by treating it as both face distortion and bulk distortion. Three scenarios are discussed: an ideally bent crystal without heat load, a bent crystal with thermally induced face distortion and a bent crystal with thermally induced bulk distortion. The mutual consistency in tracing confirms the validity of the crystal simulation. Two thermal distortion assessment tools are available: one for the rapid evaluation of the impact of significant distortions, and the other for the refined reflection of interior lattice plane distortions, which constitutes a key innovation of the simulation. The tracing outcomes offer valuable guidance for decision making and risk mitigation in the optical design process.</p>","PeriodicalId":48737,"journal":{"name":"Journal of Applied Crystallography","volume":"58 1","pages":"154-167"},"PeriodicalIF":2.8000,"publicationDate":"2025-01-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Simulation of bent Laue crystals for a high-energy X-ray monochromator with heat load consideration\",\"authors\":\"Jiayi Wang,&nbsp;Lidan Gao,&nbsp;Ming Li,&nbsp;Yiming Yang,&nbsp;Yanchun Li,&nbsp;Hu Cheng,&nbsp;Longlong Fan,&nbsp;Youkang Wang,&nbsp;Huilong Guo,&nbsp;Quanjie Jia\",\"doi\":\"10.1107/S1600576724011841\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>The performance of a double-crystal Laue-case monochromator has been evaluated for the Engineering Material beamline at the High Energy Photon Source. Expanding on the <i>xrt</i> framework, the crystal simulation incorporates the Penning–Polder and multilamellar models to determine the crystal diffraction profiles and utilizes two approaches, analytical expression and discrete point, for crystal depiction. The simulation accounts for the heat load by treating it as both face distortion and bulk distortion. Three scenarios are discussed: an ideally bent crystal without heat load, a bent crystal with thermally induced face distortion and a bent crystal with thermally induced bulk distortion. The mutual consistency in tracing confirms the validity of the crystal simulation. Two thermal distortion assessment tools are available: one for the rapid evaluation of the impact of significant distortions, and the other for the refined reflection of interior lattice plane distortions, which constitutes a key innovation of the simulation. The tracing outcomes offer valuable guidance for decision making and risk mitigation in the optical design process.</p>\",\"PeriodicalId\":48737,\"journal\":{\"name\":\"Journal of Applied Crystallography\",\"volume\":\"58 1\",\"pages\":\"154-167\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2025-01-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Applied Crystallography\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1107/S1600576724011841\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Applied Crystallography","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1107/S1600576724011841","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

对工程材料光束线在高能光子源下的双晶劳厄格单色仪的性能进行了评价。在xrt框架的基础上,晶体模拟采用了Penning-Polder模型和多层模型来确定晶体衍射曲线,并采用解析表达式和离散点两种方法来描述晶体。该模拟将热负荷同时视为面畸变和体畸变。讨论了三种情况:无热负荷的理想弯曲晶体、具有热致面畸变的弯曲晶体和具有热致体畸变的弯曲晶体。示踪的相互一致性证实了晶体模拟的有效性。热畸变评估工具有两种:一种用于快速评估显著畸变的影响,另一种用于精确反映内部晶格平面畸变,这是模拟的关键创新。跟踪结果为光学设计过程中的决策和风险降低提供了有价值的指导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Simulation of bent Laue crystals for a high-energy X-ray monochromator with heat load consideration

The performance of a double-crystal Laue-case monochromator has been evaluated for the Engineering Material beamline at the High Energy Photon Source. Expanding on the xrt framework, the crystal simulation incorporates the Penning–Polder and multilamellar models to determine the crystal diffraction profiles and utilizes two approaches, analytical expression and discrete point, for crystal depiction. The simulation accounts for the heat load by treating it as both face distortion and bulk distortion. Three scenarios are discussed: an ideally bent crystal without heat load, a bent crystal with thermally induced face distortion and a bent crystal with thermally induced bulk distortion. The mutual consistency in tracing confirms the validity of the crystal simulation. Two thermal distortion assessment tools are available: one for the rapid evaluation of the impact of significant distortions, and the other for the refined reflection of interior lattice plane distortions, which constitutes a key innovation of the simulation. The tracing outcomes offer valuable guidance for decision making and risk mitigation in the optical design process.

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Journal of Applied Crystallography
Journal of Applied Crystallography CHEMISTRY, MULTIDISCIPLINARYCRYSTALLOGRAPH-CRYSTALLOGRAPHY
CiteScore
7.80
自引率
3.30%
发文量
178
期刊介绍: Many research topics in condensed matter research, materials science and the life sciences make use of crystallographic methods to study crystalline and non-crystalline matter with neutrons, X-rays and electrons. Articles published in the Journal of Applied Crystallography focus on these methods and their use in identifying structural and diffusion-controlled phase transformations, structure-property relationships, structural changes of defects, interfaces and surfaces, etc. Developments of instrumentation and crystallographic apparatus, theory and interpretation, numerical analysis and other related subjects are also covered. The journal is the primary place where crystallographic computer program information is published.
期刊最新文献
Application of X-ray absorption spectroscopy with a laboratory X-ray powder diffractometer Direct derivation of the pair distance distribution function with application to biological small-angle scattering data Correlation-aware binning for small-angle neutron scattering via Gaussian-process inference One-dimensional Trench-MWPC detector for the D20 powder diffractometer at the Institut Laue–Langevin Crystallite orientation and lateral material distribution in transition metal dichalcogenide thin films studied by laboratory GIWAXS
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1