一种有效的有源相控阵天线无功近场测量方法

IF 4.8 2区 计算机科学 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Antennas and Wireless Propagation Letters Pub Date : 2024-11-25 DOI:10.1109/LAWP.2024.3505894
Ning Leng;Liao Ma;Zhanjian Liang;Shiyuan Zhang;Sai Chen;Ming Bai
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引用次数: 0

摘要

有源相控阵天线的近场测量通常在距离天线几个波长的辐射区域进行。分布在天线表面的无功近场携带着高分辨率的信息,适合于阵列元件的测量。然而,受传统近场探头(如开放式波导)孔径大小的限制,无法获得有源相控天线的高分辨率无功近场分布。在这封信中,我们提出了一种有效的反应性近场测量方法,利用扫描光诱导等离子体散射技术。对一种ka波段有源发射相控阵天线进行了测量。该方法能够以高分辨率直接观察无功近场分布,从而在数十秒内实现天线工作状态的高效测量。结果表明,该方法能有效地实现无功近场测量,在天线阵诊断中具有很大的应用潜力。
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An Efficient Reactive Near-Field Measurement Method for Active Phased Array Antennas
Near-field measurements of active phased array antennas are typically carried out in the radiation region several wavelengths away from the antennas. The reactive near field distributed on the antenna surface carries high-resolution information, which is suitable for the array element measurement. However, limited by the aperture size of the conventional near-field probe (such as the open-ended waveguide), it is unable to obtain the high-resolution reactive near-field distribution of the active phased antennas. In this letter, we propose an efficient reactive near-field measurement method utilizing scanning optic-induced plasma scattering technology. A Ka-band active transmitting phased array antenna was measured. This method enables the direct observation of reactive near-field distributions with high resolution, allowing for high-efficiency measurement of the antenna operational states in tens of seconds. It is demonstrated that the proposed method can achieve the reactive near-field measurement efficiently and has significant potential for applications in antenna array diagnosis.
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来源期刊
CiteScore
8.00
自引率
9.50%
发文量
529
审稿时长
1.0 months
期刊介绍: IEEE Antennas and Wireless Propagation Letters (AWP Letters) is devoted to the rapid electronic publication of short manuscripts in the technical areas of Antennas and Wireless Propagation. These are areas of competence for the IEEE Antennas and Propagation Society (AP-S). AWPL aims to be one of the "fastest" journals among IEEE publications. This means that for papers that are eventually accepted, it is intended that an author may expect his or her paper to appear in IEEE Xplore, on average, around two months after submission.
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