Weijie Ma, Qing Zhang, Jie Zhu, Yang Guo, Yajing Sun, Lin Li and Dechao Geng
{"title":"通过空间限制法对双层 MoS2 kirigami 结构进行边缘诱导选择性蚀刻。","authors":"Weijie Ma, Qing Zhang, Jie Zhu, Yang Guo, Yajing Sun, Lin Li and Dechao Geng","doi":"10.1039/D4NH00561A","DOIUrl":null,"url":null,"abstract":"<p >The controllable preparation of edge arrangements, particularly the customization of zigzag edges on demand, remains elusive. Here, a selective etching strategy to directly regulate Mo-zigzag and S-zigzag edges of MoS<small><sub>2</sub></small> kirigami structures is proposed, paving the way for edge engineering of 2D materials and providing promising candidates for next-generation optoelectronics.</p>","PeriodicalId":93,"journal":{"name":"Nanoscale Horizons","volume":" 5","pages":" 957-965"},"PeriodicalIF":6.6000,"publicationDate":"2025-03-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Edge-induced selective etching of bilayer MoS2 kirigami structures via a space-confined method†\",\"authors\":\"Weijie Ma, Qing Zhang, Jie Zhu, Yang Guo, Yajing Sun, Lin Li and Dechao Geng\",\"doi\":\"10.1039/D4NH00561A\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p >The controllable preparation of edge arrangements, particularly the customization of zigzag edges on demand, remains elusive. Here, a selective etching strategy to directly regulate Mo-zigzag and S-zigzag edges of MoS<small><sub>2</sub></small> kirigami structures is proposed, paving the way for edge engineering of 2D materials and providing promising candidates for next-generation optoelectronics.</p>\",\"PeriodicalId\":93,\"journal\":{\"name\":\"Nanoscale Horizons\",\"volume\":\" 5\",\"pages\":\" 957-965\"},\"PeriodicalIF\":6.6000,\"publicationDate\":\"2025-03-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nanoscale Horizons\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://pubs.rsc.org/en/content/articlelanding/2025/nh/d4nh00561a\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"CHEMISTRY, PHYSICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanoscale Horizons","FirstCategoryId":"88","ListUrlMain":"https://pubs.rsc.org/en/content/articlelanding/2025/nh/d4nh00561a","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
Edge-induced selective etching of bilayer MoS2 kirigami structures via a space-confined method†
The controllable preparation of edge arrangements, particularly the customization of zigzag edges on demand, remains elusive. Here, a selective etching strategy to directly regulate Mo-zigzag and S-zigzag edges of MoS2 kirigami structures is proposed, paving the way for edge engineering of 2D materials and providing promising candidates for next-generation optoelectronics.
期刊介绍：
Nanoscale Horizons stands out as a premier journal for publishing exceptionally high-quality and innovative nanoscience and nanotechnology. The emphasis lies on original research that introduces a new concept or a novel perspective (a conceptual advance), prioritizing this over reporting technological improvements. Nevertheless, outstanding articles showcasing truly groundbreaking developments, including record-breaking performance, may also find a place in the journal. Published work must be of substantial general interest to our broad and diverse readership across the nanoscience and nanotechnology community.
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