DNA水解IgG催化抗体:精神病和自身免疫之间的新联系。

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2021-02-26 DOI:10.1038/s41537-021-00143-6
Rajendran Ramesh, Aparna Sundaresh, Ravi Philip Rajkumar, Vir Singh Negi, M A Vijayalakshmi, Rajagopal Krishnamoorthy, Ryad Tamouza, Marion Leboyer, A S Kamalanathan
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引用次数: 6

摘要

在精神障碍患者中,即精神分裂症(SCZ)和双相情感障碍(BPD)的重要亚群中,观察自身免疫合并症并不罕见。为了了解自身免疫基础,我们采用内部优化的DNA酶测定法,定量检测了精神病患者血清多克隆IgG抗体介导的DNA酶活性。神经精神-系统性红斑狼疮(NP-SLE)患者IgG抗体的类似活性被用作比较物。我们的数据显示,SCZ的IgG DNase活性与NP-SLE接近,比健康对照高2倍。有趣的是,DNase活性与PANSS(阳性,一般和总分)和MADRS之间的关联分别在SCZ和BPD患者亚组中被注意到。在我们的研究组中,BPD患者的IL-6和总IgG水平高于SCZ和健康对照组,表明BPD具有相对的炎症性,而SCZ患者主要观察到自身免疫性合并症。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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DNA hydrolysing IgG catalytic antibodies: an emerging link between psychoses and autoimmunity.

It is not uncommon to observe autoimmune comorbidities in a significant subset of patients with psychotic disorders, namely schizophrenia (SCZ) and bipolar disorder (BPD). To understand the autoimmune basis, the DNA abyzme activity mediated by serum polyclonal IgG Abs were examined in psychoses patients, quantitatively, by an in-house optimized DNase assay. A similar activity exhibited by IgG Abs from neuropsychiatric-systemic lupus erythematosus (NP-SLE) patients was used as a comparator. Our data revealed that the IgG DNase activity of SCZ was close to that of NP-SLE and it was twofold higher than the healthy controls. Interestingly, the association between DNase activity with PANSS (positive, general and total scores) and MADRS were noted in a subgroup of SCZ and BPD patients, respectively. In our study group, the levels of IL-6 and total IgG in BPD patients were higher than SCZ and healthy controls, indicating a relatively inflammatory nature in BPD, while autoimmune comorbidity was mainly observed in SCZ patients.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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