mge磁量子点的电场控制铁磁性。

Nano reviews Pub Date : 2011-01-01 Epub Date: 2011-03-07 DOI:10.3402/nano.v2i0.5896
Faxian Xiu, Yong Wang, Jin Zou, Kang L Wang
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引用次数: 4

摘要

室温下磁场控制磁性半导体中的铁磁性是实现实用自旋电子学和非易失性逻辑器件的重要途径之一。虽然mn掺杂III-V半导体被认为是实现这种可控性的潜在候选者,但寻找具有高居里温度(T(c)>300 K)和室温下可控铁磁性的理想材料已经持续了近十年。在各种稀磁半导体(dms)中,来自IV族元素的材料,如Si和Ge,由于其与传统互补金属氧化物半导体(CMOS)技术的良好兼容性,是这类材料的理想候选者。本文回顾了近年来高居里温度Mn(0.05)Ge(0.95)量子点(QDs)的研究进展,并成功地演示了电场对Mn(0.05)Ge(0.95)量子点中高达300 K的铁磁性的控制。将栅极偏置应用于金属氧化物半导体(MOS)电容器后,通道层(即Mn(0.05)Ge(0.95)量子点)的铁磁性被调制为空穴浓度的函数。最后,提出了一个基于磁极化子形成的理论模型来解释观测到的场控铁磁性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Electric-field controlled ferromagnetism in MnGe magnetic quantum dots.

Electric-field control of ferromagnetism in magnetic semiconductors at room temperature has been actively pursued as one of the important approaches to realize practical spintronics and non-volatile logic devices. While Mn-doped III-V semiconductors were considered as potential candidates for achieving this controllability, the search for an ideal material with high Curie temperature (T(c)>300 K) and controllable ferromagnetism at room temperature has continued for nearly a decade. Among various dilute magnetic semiconductors (DMSs), materials derived from group IV elements such as Si and Ge are the ideal candidates for such materials due to their excellent compatibility with the conventional complementary metal-oxide-semiconductor (CMOS) technology. Here, we review recent reports on the development of high-Curie temperature Mn(0.05)Ge(0.95) quantum dots (QDs) and successfully demonstrate electric-field control of ferromagnetism in the Mn(0.05)Ge(0.95) quantum dots up to 300 K. Upon the application of gate-bias to a metal-oxide-semiconductor (MOS) capacitor, the ferromagnetism of the channel layer (i.e. the Mn(0.05)Ge(0.95) quantum dots) was modulated as a function of the hole concentration. Finally, a theoretical model based upon the formation of magnetic polarons has been proposed to explain the observed field controlled ferromagnetism.

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