NML（澳大利亚）和NBS（美国）之间硅伪影的密度比较。

Journal of research of the National Bureau of Standards (1977) Pub Date : 1985-07-01 DOI:10.6028/jres.090.016

J B Patterson, R S Davis

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引用次数: 3

摘要

NML（澳大利亚）和NBS（美国）测量了四种硅伪影的密度，单位为1×10-6。协议在每个实验室的实验不确定性范围内。其中两个伪像已用于NBS的阿伏伽德罗常数的测定。剩下的两个物体已在国家统计局用于建立可用作标准参考材料（SRM）的硅密度伪影。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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A Density Comparison of Silicon Artifacts Between NML (Australia) and NBS (U.S.).

The densities of four silicon artifacts were measured in SI units to 1 × 10^-6 by NML (Australia) and NBS (U.S.). Agreement is within the experimental uncertainty of each laboratory. Two of the artifacts had been used in the determination of the Avogadro constant at NBS. The remaining two objects had been used at NBS to establish silicon density artifacts available as a Standard Reference Material (SRM).

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Journal of research of the National Bureau of Standards (1977)

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