走向极紫外光刻:光刻胶的进展与挑战

Cui Hao, Wang Qian-qian, Wang Xiao-Lin, He Xiang-ming, Xu Hong
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Towards Extreme Ultraviolet Lithography: Progress and Challenges of Photoresists
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来源期刊
应用化学
应用化学 化学
CiteScore
0.90
自引率
0.00%
发文量
9102
期刊介绍: Founded in 1983, Chinese Journal of Applied Chemistry is a comprehensive academic journal published and distributed worldwide by the Science Press. The journal, governed by the Chinese Academy of Sciences (CAS), is sponsored by the Chinese Chemical Society (CCS) and the Changchun Institute of Applied Chemistry (CIAC). The journal mainly reports on innovative basic research and creative scientific results in chemistry and inter-disciplines. It is published on the 10th day of each month and delivers approximately 1400 pages each year of research articles and reviews on cutting-edge areas in chemistry, including organic chemistry, inorganic chemistry, physical chemistry, analytical chemistry, polymer chemistry, materials science, life science, and information science. Chinese Journal of Applied Chemistry is a peer-reviewed and open access journal consisting of Reviews, Research Articles and Communications. Articles published in the journal are included in 11 domestic and international databases. The Readership include Chemists in research institutes, colleges, universities, and relevant industries.
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