室温原子层沉积法在氧化锆上沉积二氧化硅:对贴面陶瓷结合强度的影响。

S. Bitencourt, B. Hatton, N. Bastos-Bitencourt, Daniela Micheline Dos Santos, A. Pesqueira, G. de Souza
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RT-ALD was performed by the sequential exposure of specimens to vapor of tetramethoxysilane orthosilicate (TMOS) and ammonium hydroxide (NH4OH). Y-TZP surface wettability and shear bond strength (SBS) between Y-TZP and the veneering ceramic were analyzed for all groups after surface treatments. One-way ANOVA and Tukey's HSD test were used for data analysis (p ≤ 0.05).\n\n\nRESULTS\nThe highest contact angle was observed for the control group (64.46 ± 6.09 θ), while the lowest values (p < 0.001) were presented after Si20 (29.85 ± 4.23 θ) and Si40 (30.37 ± 5.51 θ) treatments. Hydrothermal treatment (49.3 ± 2.69 θ) and alumina abrasion (45.84 ± 4.12 θ) resulted in intermediate contact angle values. The highest SBS values were observed for Al (16.74 ± 1.68 MPa) and Ht (15.27 ± 2.11 MPa) groups (p < 0.018). 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引用次数: 3

摘要

PURPOSET开发并表征氧化钇稳定氧化锆(Y-TZP)转化层和二氧化硅基纳米膜之间的混合界面,以实现Y-TZP和贴面陶瓷之间的更好结合。材料和方法将6个完全烧结的矩形Y-TZP试样按表面处理分为6组:C(对照):不处理;Al:27μm氧化铝颗粒磨损;Ht:高压釜水热处理15h;Si20:20使用室温原子层沉积(RT-ALD)的二氧化硅沉积循环;Si40:40次RT-ALD循环;Ht+Si40:水热处理后进行40次RT-ALD循环。RT-ALD是通过将样品依次暴露于原硅酸四甲氧基硅烷(TMOS)和氢氧化铵(NH4OH)的蒸汽中来进行的。分析了表面处理后所有组的Y-TZP表面润湿性和Y-TZP与贴面陶瓷之间的剪切结合强度(SBS)。结果对照组接触角最高(64.46±6.09θ),最低(p 0.998)。氧化铝颗粒磨损改善了SBS值,同时观察到润湿性降低。
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Silica deposition on zirconia via room-temperature atomic layer deposition (RT-ALD): Effect on bond strength to veneering ceramic.
PURPOSE To develop and to characterize a hybrid interface between yttria-stabilized zirconia (Y-TZP) transformed layer and silica-based nanofilm to enable a better bonding between Y-TZP and a veneering ceramic. MATERIAL AND METHODS Sixty-six fully-sintered rectangular Y-TZP specimens were distributed into 6 groups, according to the surface treatment applied: C (control): no treatment; Al: 27 μm-alumina particle abrasion; Ht: hydrothermal treatment in autoclave for 15h; Si20: 20 cycles of silica deposition using room-temperature atomic layer deposition (RT-ALD); Si40: 40 cycles of RT-ALD; Ht + Si40: hydrothermal treatment followed by 40 cycles of RT-ALD. RT-ALD was performed by the sequential exposure of specimens to vapor of tetramethoxysilane orthosilicate (TMOS) and ammonium hydroxide (NH4OH). Y-TZP surface wettability and shear bond strength (SBS) between Y-TZP and the veneering ceramic were analyzed for all groups after surface treatments. One-way ANOVA and Tukey's HSD test were used for data analysis (p ≤ 0.05). RESULTS The highest contact angle was observed for the control group (64.46 ± 6.09 θ), while the lowest values (p < 0.001) were presented after Si20 (29.85 ± 4.23 θ) and Si40 (30.37 ± 5.51 θ) treatments. Hydrothermal treatment (49.3 ± 2.69 θ) and alumina abrasion (45.84 ± 4.12 θ) resulted in intermediate contact angle values. The highest SBS values were observed for Al (16.74 ± 1.68 MPa) and Ht (15.27 ± 2.11 MPa) groups (p < 0.018). Groups Si20 (9.66 ± 1.22 MPa), Si40 (9.33 ± 2.11 MPa), Ht + Si40 (9.37 ± 1.02 MPa) and C (12.54 ± 2.64 MPa) all resulted in similar SBS results (p > 0.998). CONCLUSION The experimental treatments proposed enhanced surface wettability, but shear bond strength between Y-TZP and veneering ceramic was not improved. Alumina particle-abrasion improved SBS values while a decrease in wettability was observed.
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