用于校正S-BSL7光学元件图形误差的大气等离子体射流处理

IF 1.9 4区 物理与天体物理 Q3 OPTICS Journal of the European Optical Society-Rapid Publications Pub Date : 2022-06-24 DOI:10.1051/jeos/2022003
H. Müller, T. Waak, U. Birnbaum, G. Böhm, T. Arnold
{"title":"用于校正S-BSL7光学元件图形误差的大气等离子体射流处理","authors":"H. Müller, T. Waak, U. Birnbaum, G. Böhm, T. Arnold","doi":"10.1051/jeos/2022003","DOIUrl":null,"url":null,"abstract":"To meet the increasing market demand for optical components, Plasma Jet Machining (PJM) of Borosilicate Crown Glass (BCG), which can be an alternative to Fused Silica, is presented. Surface figure error correction was performed by applying reactive plasma jet etching, where a fluorine containing microwave driven plasma jet is employed to reduce the figure error in a deterministic dwell-time controlled dry etching process. However, some of the glass constituents of BCG cause the formation of a residual layer during surface treatment which influences the local material removal. By heating the substrate to about Ts= 325°C to 350°C during processing, the etching behavior can clearly be improved. Geometric conditions of the optical element nevertheless lead to a characteristic temperature distribution on the substrate surface, which requires an adjustment of the local dwell times in order to obtain the required material removal. Furthermore, the resulting local surface roughness is also influenced by the surface temperature distribution. It is shown that figure error can be significantly reduced by taking the local temperature distribution and resulting local etching rates into account. A subsequent polishing step smoothens roughness features occurring during etching to provide optical surface quality.","PeriodicalId":674,"journal":{"name":"Journal of the European Optical Society-Rapid Publications","volume":null,"pages":null},"PeriodicalIF":1.9000,"publicationDate":"2022-06-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Atmospheric Plasma Jet processing for figure error correction of an optical element made from S-BSL7\",\"authors\":\"H. Müller, T. Waak, U. Birnbaum, G. Böhm, T. Arnold\",\"doi\":\"10.1051/jeos/2022003\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"To meet the increasing market demand for optical components, Plasma Jet Machining (PJM) of Borosilicate Crown Glass (BCG), which can be an alternative to Fused Silica, is presented. Surface figure error correction was performed by applying reactive plasma jet etching, where a fluorine containing microwave driven plasma jet is employed to reduce the figure error in a deterministic dwell-time controlled dry etching process. However, some of the glass constituents of BCG cause the formation of a residual layer during surface treatment which influences the local material removal. By heating the substrate to about Ts= 325°C to 350°C during processing, the etching behavior can clearly be improved. Geometric conditions of the optical element nevertheless lead to a characteristic temperature distribution on the substrate surface, which requires an adjustment of the local dwell times in order to obtain the required material removal. Furthermore, the resulting local surface roughness is also influenced by the surface temperature distribution. It is shown that figure error can be significantly reduced by taking the local temperature distribution and resulting local etching rates into account. A subsequent polishing step smoothens roughness features occurring during etching to provide optical surface quality.\",\"PeriodicalId\":674,\"journal\":{\"name\":\"Journal of the European Optical Society-Rapid Publications\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.9000,\"publicationDate\":\"2022-06-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of the European Optical Society-Rapid Publications\",\"FirstCategoryId\":\"4\",\"ListUrlMain\":\"https://doi.org/10.1051/jeos/2022003\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of the European Optical Society-Rapid Publications","FirstCategoryId":"4","ListUrlMain":"https://doi.org/10.1051/jeos/2022003","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 2

摘要

为了满足日益增长的光学元件市场需求,提出了硼硅酸盐冠玻璃(BCG)的等离子体射流加工(PJM),它可以替代熔融二氧化硅。通过应用反应等离子体射流蚀刻来进行表面图形误差校正,其中在确定性停留时间控制的干法蚀刻工艺中,使用含氟微波驱动的等离子体射流来减少图形误差。然而,BCG的一些玻璃成分会在表面处理过程中形成残余层,从而影响局部材料的去除。在处理过程中,通过将衬底加热至约Ts=325°C至350°C,可以明显改善蚀刻行为。然而,光学元件的几何条件导致衬底表面上的特征温度分布,这需要调整局部停留时间以获得所需的材料去除。此外,所得到的局部表面粗糙度也受到表面温度分布的影响。结果表明,通过考虑局部温度分布和由此产生的局部蚀刻速率,可以显著降低图形误差。随后的抛光步骤使蚀刻期间出现的粗糙特征平滑,以提供光学表面质量。
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Atmospheric Plasma Jet processing for figure error correction of an optical element made from S-BSL7
To meet the increasing market demand for optical components, Plasma Jet Machining (PJM) of Borosilicate Crown Glass (BCG), which can be an alternative to Fused Silica, is presented. Surface figure error correction was performed by applying reactive plasma jet etching, where a fluorine containing microwave driven plasma jet is employed to reduce the figure error in a deterministic dwell-time controlled dry etching process. However, some of the glass constituents of BCG cause the formation of a residual layer during surface treatment which influences the local material removal. By heating the substrate to about Ts= 325°C to 350°C during processing, the etching behavior can clearly be improved. Geometric conditions of the optical element nevertheless lead to a characteristic temperature distribution on the substrate surface, which requires an adjustment of the local dwell times in order to obtain the required material removal. Furthermore, the resulting local surface roughness is also influenced by the surface temperature distribution. It is shown that figure error can be significantly reduced by taking the local temperature distribution and resulting local etching rates into account. A subsequent polishing step smoothens roughness features occurring during etching to provide optical surface quality.
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来源期刊
CiteScore
2.40
自引率
0.00%
发文量
12
审稿时长
5 weeks
期刊介绍: Rapid progress in optics and photonics has broadened its application enormously into many branches, including information and communication technology, security, sensing, bio- and medical sciences, healthcare and chemistry. Recent achievements in other sciences have allowed continual discovery of new natural mysteries and formulation of challenging goals for optics that require further development of modern concepts and running fundamental research. The Journal of the European Optical Society – Rapid Publications (JEOS:RP) aims to tackle all of the aforementioned points in the form of prompt, scientific, high-quality communications that report on the latest findings. It presents emerging technologies and outlining strategic goals in optics and photonics. The journal covers both fundamental and applied topics, including but not limited to: Classical and quantum optics Light/matter interaction Optical communication Micro- and nanooptics Nonlinear optical phenomena Optical materials Optical metrology Optical spectroscopy Colour research Nano and metamaterials Modern photonics technology Optical engineering, design and instrumentation Optical applications in bio-physics and medicine Interdisciplinary fields using photonics, such as in energy, climate change and cultural heritage The journal aims to provide readers with recent and important achievements in optics/photonics and, as its name suggests, it strives for the shortest possible publication time.
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