Model of Reactive Magnetron Sputtering of a Two-Component Composite Target

The article proposes a model for predicting the content of metal components of complex oxide films deposited by reactive magnetron sputtering of a two-component composite target in Ar/O2 gas mixture. The model takes into account the sputtering yield and ion-electron emission coefficients of the sputtered metals and their oxides, the distribution of the ion current density on the target, and the rate of the chemical reaction of the formation of oxides of these metals. To verify the proposed model, studies of the elemental composition of titanium-aluminum oxide films deposited by magnetron sputtering of a Ti-Al composite target in Ar and Ar/O2 gas mixture were carried out. It has been established that the model adequately describes the change in the content of metals in the deposited films with a change in the oxygen flow into the chamber. The simulation error does not exceed 10 %, this makes it possible to use the proposed model for predicting the content of metals in a film during reactive sputtering of two-component composite targets.