HF磁控溅射法在介孔硅衬底上制备ZnO薄膜的结构和光学性能

IF 1.4 Q3 PHYSICS, MULTIDISCIPLINARY Turkish Journal of Physics Pub Date : 2020-02-12 DOI:10.3906/fiz-1909-10
V. Kidalov, A. Dyadenchuk, Y. Bacherikov, A. Zhuk, Tetyana Gorbaniuk, I. Rogozin, V. Kidalov
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引用次数: 9

摘要

在反应氧和氩气介质中,采用HF磁控溅射金属锌靶的方法,在中孔硅衬底上制备了ZnO薄膜。根据工作气体(氩气/氧气)的分压比,研究了在介孔衬底上获得的ZnO薄膜的性能。X射线分析表明,在沉积过程中,形成了六方结构的ZnO薄膜。研究了多孔层对ZnO薄膜结构和发光性能的影响。结果表明,多孔硅衬底降低了残余应力,可用于获得高质量的ZnO薄膜。
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Structural and optical properties of ZnO films obtained on mesoporous Si substrates by the method of HF magnetron sputtering
In the present work, ZnO films were obtained on mesoporous silicon substrates by the method of HF magnetron sputtering of a metallic zinc target in reaction oxygen and argon gas medium. The properties of the ZnO films obtained on mesoporous substrates were studied depending on the ratio of the partial pressures of the working gases (argon/oxygen). X-ray analysis showed that in the process of deposition, the ZnO films of a hexagonal structure were formed. The effect of the porous layer on the structural and luminescent properties of the thin ZnO films was studied. The results showed that the porous silicon substrate reduces residual stresses and can be used for obtaining high-quality ZnO films.
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来源期刊
Turkish Journal of Physics
Turkish Journal of Physics PHYSICS, MULTIDISCIPLINARY-
CiteScore
3.50
自引率
0.00%
发文量
8
期刊介绍: The Turkish Journal of Physics is published electronically 6 times a year by the Scientific and Technological Research Council of Turkey (TÜBİTAK) and accepts English-language manuscripts in various fields of research in physics, astrophysics, and interdisciplinary topics related to physics. Contribution is open to researchers of all nationalities.
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