{"title":"基于模型辅助双扩展状态观测器的光电稳定平台自抗扰控制","authors":"Peng Gao, Xiuqin Su, Wenbo Zhang","doi":"10.1108/aa-01-2022-0018","DOIUrl":null,"url":null,"abstract":"\nPurpose\nThis study aims to promote the anti-disturbance and tracking accuracy of optoelectronic stabilized platforms, which ensure that optical detectors accurately track targets and acquire high-quality images.\n\n\nDesign/methodology/approach\nAn improved active disturbance rejection control (ADRC) strategy based on model-assisted double extended state observers (MDESOs) is proposed in this paper. First, by establishing an auxiliary model, the total disturbances are separated into two parts: inner and external disturbances. Then, MDESOs are designed to estimate the two parts by separately using two parallel ESOs, by which the controlled plant is adjusted to the ideal pure integral series. Simultaneously, combined with the nonlinear state error feedback, an overall control strategy is established.\n\n\nFindings\nCompared with the conventional ADRC and proportional derivative, the improved ADRC (IADRC) has stronger robustness and adaptability and effectively reduces the requirements for model accuracy and the gain of the ESO. The error of the auxiliary model is tolerated to exceed 50%, and the parameter values of the MDESOs are reduced by 90%.\n\n\nOriginality/value\nThe total disturbance rejection rate of the proposed strategy is only 3.11% under multiple disturbances, which indicates that the IADRC strategy significantly promotes anti-disturbance performance.\n","PeriodicalId":55448,"journal":{"name":"Assembly Automation","volume":" ","pages":""},"PeriodicalIF":1.9000,"publicationDate":"2022-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Active disturbance rejection control for optoelectronic stabilized platform based on model-assisted double extended state observers\",\"authors\":\"Peng Gao, Xiuqin Su, Wenbo Zhang\",\"doi\":\"10.1108/aa-01-2022-0018\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\\nPurpose\\nThis study aims to promote the anti-disturbance and tracking accuracy of optoelectronic stabilized platforms, which ensure that optical detectors accurately track targets and acquire high-quality images.\\n\\n\\nDesign/methodology/approach\\nAn improved active disturbance rejection control (ADRC) strategy based on model-assisted double extended state observers (MDESOs) is proposed in this paper. First, by establishing an auxiliary model, the total disturbances are separated into two parts: inner and external disturbances. Then, MDESOs are designed to estimate the two parts by separately using two parallel ESOs, by which the controlled plant is adjusted to the ideal pure integral series. Simultaneously, combined with the nonlinear state error feedback, an overall control strategy is established.\\n\\n\\nFindings\\nCompared with the conventional ADRC and proportional derivative, the improved ADRC (IADRC) has stronger robustness and adaptability and effectively reduces the requirements for model accuracy and the gain of the ESO. The error of the auxiliary model is tolerated to exceed 50%, and the parameter values of the MDESOs are reduced by 90%.\\n\\n\\nOriginality/value\\nThe total disturbance rejection rate of the proposed strategy is only 3.11% under multiple disturbances, which indicates that the IADRC strategy significantly promotes anti-disturbance performance.\\n\",\"PeriodicalId\":55448,\"journal\":{\"name\":\"Assembly Automation\",\"volume\":\" \",\"pages\":\"\"},\"PeriodicalIF\":1.9000,\"publicationDate\":\"2022-09-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Assembly Automation\",\"FirstCategoryId\":\"94\",\"ListUrlMain\":\"https://doi.org/10.1108/aa-01-2022-0018\",\"RegionNum\":4,\"RegionCategory\":\"计算机科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"AUTOMATION & CONTROL SYSTEMS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Assembly Automation","FirstCategoryId":"94","ListUrlMain":"https://doi.org/10.1108/aa-01-2022-0018","RegionNum":4,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"AUTOMATION & CONTROL SYSTEMS","Score":null,"Total":0}
Active disturbance rejection control for optoelectronic stabilized platform based on model-assisted double extended state observers
Purpose
This study aims to promote the anti-disturbance and tracking accuracy of optoelectronic stabilized platforms, which ensure that optical detectors accurately track targets and acquire high-quality images.
Design/methodology/approach
An improved active disturbance rejection control (ADRC) strategy based on model-assisted double extended state observers (MDESOs) is proposed in this paper. First, by establishing an auxiliary model, the total disturbances are separated into two parts: inner and external disturbances. Then, MDESOs are designed to estimate the two parts by separately using two parallel ESOs, by which the controlled plant is adjusted to the ideal pure integral series. Simultaneously, combined with the nonlinear state error feedback, an overall control strategy is established.
Findings
Compared with the conventional ADRC and proportional derivative, the improved ADRC (IADRC) has stronger robustness and adaptability and effectively reduces the requirements for model accuracy and the gain of the ESO. The error of the auxiliary model is tolerated to exceed 50%, and the parameter values of the MDESOs are reduced by 90%.
Originality/value
The total disturbance rejection rate of the proposed strategy is only 3.11% under multiple disturbances, which indicates that the IADRC strategy significantly promotes anti-disturbance performance.
期刊介绍:
Assembly Automation publishes peer reviewed research articles, technology reviews and specially commissioned case studies. Each issue includes high quality content covering all aspects of assembly technology and automation, and reflecting the most interesting and strategically important research and development activities from around the world. Because of this, readers can stay at the very forefront of industry developments.
All research articles undergo rigorous double-blind peer review, and the journal’s policy of not publishing work that has only been tested in simulation means that only the very best and most practical research articles are included. This ensures that the material that is published has real relevance and value for commercial manufacturing and research organizations.