基于模型辅助双扩展状态观测器的光电稳定平台自抗扰控制

IF 1.9 4区 计算机科学 Q3 AUTOMATION & CONTROL SYSTEMS Assembly Automation Pub Date : 2022-09-23 DOI:10.1108/aa-01-2022-0018
Peng Gao, Xiuqin Su, Wenbo Zhang
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引用次数: 1

摘要

目的本研究旨在提高光电稳定平台的抗干扰和跟踪精度,以确保光学探测器准确跟踪目标并获得高质量的图像。设计/方法/途径本文提出了一种基于模型辅助双扩展状态观测器的改进型自抗扰控制策略。首先,通过建立辅助模型,将总扰动分为内部扰动和外部扰动两部分。然后,MDESO被设计为通过分别使用两个平行的ESO来估计这两个部分,通过这两个ESO将受控对象调整为理想的纯积分级数。同时,结合非线性状态误差反馈,建立了整体控制策略。结果与传统的自抗扰控制器和比例导数相比,改进的自抗干扰控制器具有更强的鲁棒性和适应性,有效地降低了对模型精度和ESO增益的要求。辅助模型的误差可容忍超过50%,MDESO的参数值降低了90%。独创性/价值在多重干扰下,所提出的策略的总干扰抑制率仅为3.11%,这表明IADRC策略显著提高了抗干扰性能。
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Active disturbance rejection control for optoelectronic stabilized platform based on model-assisted double extended state observers
Purpose This study aims to promote the anti-disturbance and tracking accuracy of optoelectronic stabilized platforms, which ensure that optical detectors accurately track targets and acquire high-quality images. Design/methodology/approach An improved active disturbance rejection control (ADRC) strategy based on model-assisted double extended state observers (MDESOs) is proposed in this paper. First, by establishing an auxiliary model, the total disturbances are separated into two parts: inner and external disturbances. Then, MDESOs are designed to estimate the two parts by separately using two parallel ESOs, by which the controlled plant is adjusted to the ideal pure integral series. Simultaneously, combined with the nonlinear state error feedback, an overall control strategy is established. Findings Compared with the conventional ADRC and proportional derivative, the improved ADRC (IADRC) has stronger robustness and adaptability and effectively reduces the requirements for model accuracy and the gain of the ESO. The error of the auxiliary model is tolerated to exceed 50%, and the parameter values of the MDESOs are reduced by 90%. Originality/value The total disturbance rejection rate of the proposed strategy is only 3.11% under multiple disturbances, which indicates that the IADRC strategy significantly promotes anti-disturbance performance.
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来源期刊
Assembly Automation
Assembly Automation 工程技术-工程:制造
CiteScore
4.30
自引率
14.30%
发文量
51
审稿时长
3.3 months
期刊介绍: Assembly Automation publishes peer reviewed research articles, technology reviews and specially commissioned case studies. Each issue includes high quality content covering all aspects of assembly technology and automation, and reflecting the most interesting and strategically important research and development activities from around the world. Because of this, readers can stay at the very forefront of industry developments. All research articles undergo rigorous double-blind peer review, and the journal’s policy of not publishing work that has only been tested in simulation means that only the very best and most practical research articles are included. This ensures that the material that is published has real relevance and value for commercial manufacturing and research organizations.
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