超越大面积硅太阳能电池的朗伯氏光捕获:制造方法

IF 15.3 1区 物理与天体物理 Q1 OPTICS Opto-Electronic Advances Pub Date : 2021-12-31 DOI:10.29026/oea.2022.210086
J. Maksimovic, Jingwen Hu, S. Ng, T. Katkus, G. Seniutinas, T. P. Rivera, M. Stuiber, Y. Nishijima, S. John, S. Juodkazis
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引用次数: 6

摘要

硅太阳能电池表面的光捕获光子晶体(PhC)图案为单结电池的光-电功率转换提供了一个接近32.3%理论效率极限的新机会。这超出了光线捕获29%的朗伯极限所暗示的效率极限。干涉和慢光效应被用来收集光,即使在Si带隙附近的长波长下也是如此。我们比较了两种不同的表面图案化方法,这两种方法可以扩展到大面积表面图案:1)激光直接写入和2)分步重复5次缩小投影光刻。将这些方法的大面积吞吐量限制与已建立的电子束光刻(EBL)路线进行比较,后者是传统使用的,但比所提出的方法慢得多。比较了不同方法制备的样品的PhC光捕获的光谱特征。通过激光图案化掩模蚀刻的Si在可见波长下的反射率为7%,并且与通过EBL制造的掩模图案化的Si相当。后一种模式显示出比朗伯极限更强的吸光度(M.-L.Hieh等人,Sci.Rep.1011857(2020))。
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Beyond Lambertian light trapping for large-area silicon solar cells: fabrication methods
Light trapping photonic crystal (PhC) patterns on the surface of Si solar cells provides a novel opportunity to approach the theoretical efficiency limit of 32.3%, for light-to-electrical power conversion with a single junction cell. This is beyond the efficiency limit implied by the Lambertian limit of ray trapping 29%. The interference and slow light effects are harnessed for collecting light even at the long wavelengths near the Si band-gap. We compare two different methods for surface patterning, that can be extended to large area surface patterning: 1) laser direct write and 2) step-&-repeat 5-times reduction projection lithography. Large area throughput limitations of these methods are compared with the established electron beam lithography (EBL) route, which is conventionally utilised but much slower than the presented methods. Spectral characterisation of the PhC light trapping is compared for samples fabricated by different methods. Reflectance of Si etched via laser patterned mask was 7% at visible wavelengths and was comparable with Si patterned via EBL made mask. The later pattern showed a stronger absorbance than the Lambertian limit (M.-L. Hsieh et al., Sci. Rep. 10, 11857 (2020)).
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来源期刊
CiteScore
19.30
自引率
7.10%
发文量
128
期刊介绍: Opto-Electronic Advances (OEA) is a distinguished scientific journal that has made significant strides since its inception in March 2018. Here's a collated summary of its key features and accomplishments: Impact Factor and Ranking: OEA boasts an impressive Impact Factor of 14.1, which positions it within the Q1 quartiles of the Optics category. This high ranking indicates that the journal is among the top 25% of its field in terms of citation impact. Open Access and Peer Review: As an open access journal, OEA ensures that research findings are freely available to the global scientific community, promoting wider dissemination and collaboration. It upholds rigorous academic standards through a peer review process, ensuring the quality and integrity of the published research. Database Indexing: OEA's content is indexed in several prestigious databases, including the Science Citation Index (SCI), Engineering Index (EI), Scopus, Chemical Abstracts (CA), and the Index to Chinese Periodical Articles (ICI). This broad indexing facilitates easy access to the journal's articles by researchers worldwide. Scope and Purpose: OEA is committed to serving as a platform for the exchange of knowledge through the publication of high-quality empirical and theoretical research papers. It covers a wide range of topics within the broad area of optics, photonics, and optoelectronics, catering to researchers, academicians, professionals, practitioners, and students alike.
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