高级微电子计量车间

Q3 Physics and Astronomy Synchrotron Radiation News Pub Date : 2022-09-03 DOI:10.1080/08940886.2022.2135946
Chang-Yong Nam, Y. S. Chu, Satyavolu S. Papa Rao, G. Carini
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引用次数: 0

摘要

2022年5月25日,在布鲁克黑文国家实验室(BNL)举行的NSLS-II和CFN虚拟联合用户会议期间,举办了题为“应对关键微电子挑战的先进计量需求”的研讨会。研讨会由组织者对设施的介绍和来自工业界、学术界和国家实验室的七场受邀演讲组成,为讨论半导体制造的最新计量需求现状以及微电子未来的相关挑战提供了一个生动的论坛。研讨会小组讨论了国家实验室在应对半导体计量挑战方面的潜在作用,特别是BNL设施,包括国家同步加速器光源II(NSLS-II)、功能纳米材料中心(CFN)和仪器部门。纽约州立大学(SUNY)的非营利附属公司NY CREATES的研究副总裁Satyavolu Papa Rao博士发表了主题演讲,概述了纽约CREATES和奥尔巴尼纳米技术综合体。他还讨论了与《芯片法案》及其国家半导体技术中心(NSTC)相关的潜在半导体研究机会。特别关注的是异质集成、新材料和先进计量领域,这些领域对于提高能源效率、连通性和未来微电子的普遍性至关重要。Papa Rao博士强调了国家实验室及其用户设施(如同步加速器X射线源)的潜在作用,强调了用户更容易获得半导体研究和晶圆规模、操作和高分辨率计量能力的必要性。三位研讨会组织者简要介绍了BNL的微电子能力。朱勇博士概述了NSLS-II的纳米级X射线成像能力。关键功能包括纳米级三维(3D)断层扫描和应变成像,它们在可视化界面层的内部缺陷和应变场方面非常有效。Chang Yong Nam博士介绍了CFN在电子显微镜结构计量以及新型微电子材料(包括极紫外(EUV)光刻胶和混合忆阻器)的开发和表征方面的能力。量子材料出版社(QPress)也是一个亮点,这是一个用于二维(2D)材料异质结构的机器视觉辅助自动堆叠系统,对于实现超越当今尖端的下一代设备可能至关重要。Gabriella Carini医生
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Advanced Microelectronics Metrology Workshop
A workshop titled “Advanced Metrology Needs for Addressing Critical Microelectronics Challenges” was held during the virtual NSLS-II and CFN Joint Users’ Meeting at Brookhaven National Laboratory (BNL) on May 25, 2022. The workshop, consisting of facilities’ introductions by the organizers and seven invited talks from industry, academia, and national laboratories, provided a lively forum to discuss the current landscape of state-ofthe-art metrology needs for semiconductor manufacturing and associated challenges for the future of microelectronics. The workshop panel engaged in a discussion on the potential roles of national laboratories in addressing semiconductor metrology challenges, particularly BNL facilities, including the National Synchrotron Light Source II (NSLS-II), Center for Functional Nanomaterials (CFN), and Instrumentation Division. Dr. Satyavolu Papa Rao, vice president of research at NY CREATES, a non-profit affiliate corporation of the State University of New York (SUNY), delivered a keynote lecture providing an overview of NY CREATES and the Albany Nanotech Complex. He also discussed potential semiconductor research opportunities associated with the CHIPS Act and its National Semiconductor Technology Center (NSTC). Particularly addressed were the areas of heterogeneous integration, new materials, and advanced metrology, which are essential for enabling enhanced energy efficiency, connectivity, and ubiquity of future microelectronics. Dr. Papa Rao emphasized the potential roles of national laboratories and their user facilities such as synchrotron X-ray sources, stressing the need for easier user access for semiconductor research and wafer-scale, in-operando, and high-resolution metrology capabilities. Three workshop organizers gave brief overviews of the microelectronics capabilities at BNL. Dr. Yong Chu gave an overview of the nanoscale X-ray imaging capabilities of the NSLS-II. The key capabilities include nanoscale three-dimensional (3D) tomography and strain imaging, which are highly effective in visualizing the internal defects and strain field at the interface layers. Dr. Chang-Yong Nam described the CFN’s capabilities in structural metrology by electron microscopy and the development and characterization of new microelectronics materials, including extreme UV (EUV) photoresists and hybrid memristors. Also highlighted was the Quantum Materials Press (QPress), a machine-vision-assisted, automatic stacking system for two-dimensional (2D) material heterostructures, potentially critical for enabling next-generation devices beyond today’s cutting edge. Dr. Gabriella Carini gave
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来源期刊
Synchrotron Radiation News
Synchrotron Radiation News Physics and Astronomy-Nuclear and High Energy Physics
CiteScore
1.30
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0.00%
发文量
46
期刊最新文献
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