{"title":"等离子体氧化参数对直流溅射和等离子体氧化两步法生长纳米晶氧化镍薄膜物理性能的影响","authors":"F. Hajakbari, S. Rashvand, A. Hojabri","doi":"10.1007/s40094-019-00350-8","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":17598,"journal":{"name":"Journal of Theoretical and Applied Physics","volume":" ","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2019-09-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1007/s40094-019-00350-8","citationCount":"6","resultStr":"{\"title\":\"Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation\",\"authors\":\"F. Hajakbari, S. Rashvand, A. Hojabri\",\"doi\":\"10.1007/s40094-019-00350-8\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":17598,\"journal\":{\"name\":\"Journal of Theoretical and Applied Physics\",\"volume\":\" \",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-09-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1007/s40094-019-00350-8\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Theoretical and Applied Physics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1007/s40094-019-00350-8\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"Physics and Astronomy\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Theoretical and Applied Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/s40094-019-00350-8","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"Physics and Astronomy","Score":null,"Total":0}
Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation
期刊介绍:
Journal of Theoretical and Applied Physics offers an exciting publication outlet for novel and frontier physics. It encourages the submission of new research on: condensed matter physics, theoretical physics, nonlinear science, statistical physics, mathematical and computational physics, general and cross-disciplinary physics (including foundations), atomic, molecular and cluster physics, plasma and fluid physics, optical physics, biological physics, nanoscience, laser and photonics, high energy and nuclear Physics. The journal''s high standard and wide dissemination ensures a broad readership amongst the physics community. Rapid publication times and flexible length restrictions give Journal of Theoretical and Applied Physics the edge over other journals in the field. Publishing in this journal is completely free of charge.