纳米技术中卡断故障的检测

IEEE Design & Test of Computers Pub Date : 2012-08-01 DOI:10.1109/MDT.2012.2205609

V. Champac, Julio Vazquez Hernandez, S. Barcelo, Roberto Gómez, C. Hawkins, J. Segura

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引用次数: 14

摘要

集成电路的失效分析和故障建模一直是一个需要随着制造工艺的发展而不断修正和更新的领域。本文讨论了现代纳米技术中众所周知的晶体管卡开故障模型的新面貌，并提出了提高测试鲁棒性的新检测方法。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Testing of Stuck-Open Faults in Nanometer Technologies

Failure analysis and fault modeling of integrated circuits have always been fields that require continuous revision and update as manufacturing processes evolve. This paper discusses the new face of the well-known transistor stuck-open fault model in modern nanometer technologies and proposes new detection methods that improve the robustness of tests.

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