无电子阻挡层的深紫外激光二极管中第四系AlInGaN末量子势垒的掺杂效应

Pub Date : 2023-08-26 DOI:10.1007/s10946-023-10148-4
Mengshuang Yin, Xien Sang, Yuan Xu, Fang Wang, Juin J. Lion, Yuhuai Liu
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引用次数: 0

摘要

本文研究了无电子阻挡层(EBL)的深紫外激光二极管(DUV ld)掺杂四元AlInGaN末量子势垒(LQB)的性能。结果表明,n - p掺杂的LQB结构的受激辐射复合率增加。与未掺杂LQB结构相比,未掺杂EBL的四元AlInGaN LQB结构的DUV ld的阈值电流从43.79 mA降低到36.59 mA,斜率效率从1.20 W/A提高到1.28 W/A,阈值电压从4.62 V提高到4.63 V。这些结果表明,n - p掺杂结构可以显著提高DUV ld的性能。
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Doped Effects of Quaternary AlInGaN Last Quantum Barrier for Deep-Ultraviolet Laser Diodes Without Electron Blocking Layer

In this work, we investigate the performance of doped quaternary AlInGaN last quantum barrier (LQB) of deep-ultraviolet laser diodes (DUV LDs) without the electron blocking layer (EBL). The results indicate that the stimulated radiation recombination rate of the np-doped LQB structure increases. Compared with the undoped LQB structure, the threshold current of the np-doped structure of quaternary AlInGaN LQB for DUV LDs without EBL decreases from 43.79 to 36.59 mA, the slope efficiency increases from 1.20 to 1.28 W/A, and the threshold voltage increases from 4.62 to 4.63 V. These results demonstrate that the np-doped structure can significantly improve the performance of DUV LDs.

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