Yue Shen, Yanting Xu, Jun Gan, Renyao Zhang, M. Wen
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Effect of Ru targets on the growth and electrical properties of sputtering Ru films
Ruthenium (Ru) targets prepared by vacuum hot pressing of Ru powder with different morphologies. Then Ru films were deposited on SiO2/Si(100) substrate for different times by RF magnetron sputtering. The relationship in terms of the microstructure and electrical properties between Ru targets and resultant films at different conditions were studied by means of FESEM, XRD, AFM, four probe and so on. The results showed that parameters of Ru films, such as the average deposition rate, surface roughness, crystallization properties and the growth rate were directly related to the homogeneity of the microstructure of the Ru targets, but there was no correlation between the crystal orientations of the films and the targets. Moreover, the resistivity of Ru films was positively correlated with that of Ru targets.
期刊介绍：
Accounts of Chemical Research presents short, concise and critical articles offering easy-to-read overviews of basic research and applications in all areas of chemistry and biochemistry. These short reviews focus on research from the author’s own laboratory and are designed to teach the reader about a research project. In addition, Accounts of Chemical Research publishes commentaries that give an informed opinion on a current research problem. Special Issues online are devoted to a single topic of unusual activity and significance.
Accounts of Chemical Research replaces the traditional article abstract with an article "Conspectus." These entries synopsize the research affording the reader a closer look at the content and significance of an article. Through this provision of a more detailed description of the article contents, the Conspectus enhances the article's discoverability by search engines and the exposure for the research.
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