脉冲镀坡莫合金薄膜的制备及其软磁性能

Y. Omata;H. Asai;T. Shinosaki
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引用次数: 3

摘要

研究了用方波脉冲模式电流电沉积制备坡莫合金薄膜的方法,并对所得薄膜的磁性能进行了研究。研究了三个电镀参数(占空比、频率和直流偏压)对薄膜结构、合金成分和磁性能的影响。研究发现,在低占空比下,脉冲电镀可以获得μi≥4000(最大6000)且磁致伸缩为零的薄膜,且具有良好的再现性。讨论了用方波脉冲电流电沉积坡莫合金薄膜的特性。
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Preparation and Soft Magnetic Properties of Pulse-Plated Permalloy Films
A method for preparing permalloy films by electrodeposition using a square-wave pulse-mode current was studied, along with the magnetic properties of the resulting films. The influence of three plating parameters (duty cycle ratio, frequency, and dc bias) on the formation of film structures, alloy composition, and magnetic properties was investigated. It was found that films with μ i ≥4000 (max. 6000) and with zero magnetostriction can be obtained with good reproducibility by pulse-plating at a low duty cycle ratio. The characteristics of permalloy film electrodeposited using a square-wave pulse current are discussed.
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