{"title":"碳氟/氮等离子体中氧化硅氮化蚀刻的计算研究","authors":"Du Zhang, Yu-Hao Tsai, Hojin Kim, Mingmei Wang","doi":"10.33079/JOMM.19020103","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":66020,"journal":{"name":"微电子制造学报","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2019-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Nitridation-Etch of Silicon Oxide in Fluorocarbon/Nitrogen Plasma: A Computational Study\",\"authors\":\"Du Zhang, Yu-Hao Tsai, Hojin Kim, Mingmei Wang\",\"doi\":\"10.33079/JOMM.19020103\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":66020,\"journal\":{\"name\":\"微电子制造学报\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"微电子制造学报\",\"FirstCategoryId\":\"1089\",\"ListUrlMain\":\"https://doi.org/10.33079/JOMM.19020103\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"微电子制造学报","FirstCategoryId":"1089","ListUrlMain":"https://doi.org/10.33079/JOMM.19020103","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0