{"title":"[论文]聚合抑制剂在紫外光照射下LCs微观聚合物结构的形成","authors":"T. Ishinabe, S. Matsuoka, Y. Shibata, H. Fujikake","doi":"10.3169/mta.8.196","DOIUrl":null,"url":null,"abstract":"We controlled the fine-pitch polymer aggregation in liquid crystals (LCs) two-dimensionally via patterned ultraviolet (UV) irradiation, where a photomask was used to precisely control the light distribution. The combination of high-intensity UV light and a polymerization inhibitor suppressed polymerization in the masked area, and improved the uniformity of LC alignment between fine-pitch polymer structures. We were able to electrically control the diffraction patterns of polymer-dispersed LCs.","PeriodicalId":41874,"journal":{"name":"ITE Transactions on Media Technology and Applications","volume":"29 1","pages":""},"PeriodicalIF":0.5000,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"[Paper] Formation of Microscopic Polymer Structure in LCs by Patterned UV Irradiation using Polymerization Inhibitor\",\"authors\":\"T. Ishinabe, S. Matsuoka, Y. Shibata, H. Fujikake\",\"doi\":\"10.3169/mta.8.196\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We controlled the fine-pitch polymer aggregation in liquid crystals (LCs) two-dimensionally via patterned ultraviolet (UV) irradiation, where a photomask was used to precisely control the light distribution. The combination of high-intensity UV light and a polymerization inhibitor suppressed polymerization in the masked area, and improved the uniformity of LC alignment between fine-pitch polymer structures. We were able to electrically control the diffraction patterns of polymer-dispersed LCs.\",\"PeriodicalId\":41874,\"journal\":{\"name\":\"ITE Transactions on Media Technology and Applications\",\"volume\":\"29 1\",\"pages\":\"\"},\"PeriodicalIF\":0.5000,\"publicationDate\":\"2020-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ITE Transactions on Media Technology and Applications\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.3169/mta.8.196\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ITE Transactions on Media Technology and Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3169/mta.8.196","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
[Paper] Formation of Microscopic Polymer Structure in LCs by Patterned UV Irradiation using Polymerization Inhibitor
We controlled the fine-pitch polymer aggregation in liquid crystals (LCs) two-dimensionally via patterned ultraviolet (UV) irradiation, where a photomask was used to precisely control the light distribution. The combination of high-intensity UV light and a polymerization inhibitor suppressed polymerization in the masked area, and improved the uniformity of LC alignment between fine-pitch polymer structures. We were able to electrically control the diffraction patterns of polymer-dispersed LCs.
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