自组装量子点结构力学性能的分子动力学研究

T. Yamaguchi, K. Saitoh
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引用次数: 1

摘要

采用分子动力学模拟方法计算了Ge/Si(001)体系中自组装量子点结构中的应力和应变。对生长早期观察到的具有{105}面表面的Ge晶体组成的金字塔状棚屋簇进行了计算模拟。我们计算了松弛锥体结构中的原子应力和应变。原子三重态的原子应力近似定义为三重态内的两两(维里)量的平均值,即每两个原子之间的矢量积。原子应变测量(ASM)是在格林连续应变定义的基础上提出的。发现了锥体结构的应力(应变)松弛和锥体结构边缘的应力(应变)集中。讨论了锥体结构中应力和应变分布的尺寸依赖性。除锥体结构表面和Ge-Si界面外,所有模型的静水应力与原子体积应变基本呈线性关系。这意味着本研究提出的原子应力与原子应变测量ASM之间存在合理的相关性。
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Molecular Dynamics Study on Mechanical Properties in the Structure of Self-Assembled Quantum Dot
Stress and strain in the structure of self-assembled quantum dots constructed in the Ge/Si(001) system is calculated by using molecular dynamics simulation. Pyramidal hut cluster composed of Ge crystal with {105} facets surfaces observed in the early growth stage are computationally modeled. We calculate atomic stress and strain in relaxed pyramidal structure. Atomic stress for triplet of atoms is approximately defined as an average value of pairwise (virial) quantity inside triplet, which is the product of vectors between each two atoms. Atomic strain by means of atomic strain measure (ASM) which is formulated on the Green’s definition of continuum strain. We find the stress (strain) relaxation in pyramidal structure and stress (strain) concentration in the edge of pyramidal structure. We discuss size dependency of stress and strain distribution in pyramidal structure. The relationship between hydrostatic stress and atomic volumetric strain is basically linear for all models, but for the surface of pyramidal structure and Ge-Si interface. This means that there is a reasonable correlation between atomic stress proposed in the present study and atomic strain measure, ASM.
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