多孔钽生产技术

纳米科学与工程(英文) Pub Date : 2016-04-15 DOI:10.4236/WJNSE.2016.62006

Y. Tuleushev, V. Volodin, Е. А. Zhakanbaev, V. Lisitsin, A. Migunova, A. Suleymenova

{"title":"多孔钽生产技术","authors":"Y. Tuleushev, V. Volodin, Е. А. Zhakanbaev, V. Lisitsin, A. Migunova, A. Suleymenova","doi":"10.4236/WJNSE.2016.62006","DOIUrl":null,"url":null,"abstract":"Ion-plasma sputtering and codeposition of ultrafine Ta and Cd particles on a moving substrate were used to prepare the solid solutions, in particular, the alloys with up to 66.2 at.% Cd in the form of coatings. In vacuum heat treatment cadmium evaporates at 700&degC from cadmium based solid solutions resulting in formation of a porous tantalum with a highly developed surface. The prepared tantalum-based materials assume the technological application of the investigation results.","PeriodicalId":66816,"journal":{"name":"纳米科学与工程(英文)","volume":"167 1","pages":"51-57"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Technology of Porous Tantalum Production\",\"authors\":\"Y. Tuleushev, V. Volodin, Е. А. Zhakanbaev, V. Lisitsin, A. Migunova, A. Suleymenova\",\"doi\":\"10.4236/WJNSE.2016.62006\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Ion-plasma sputtering and codeposition of ultrafine Ta and Cd particles on a moving substrate were used to prepare the solid solutions, in particular, the alloys with up to 66.2 at.% Cd in the form of coatings. In vacuum heat treatment cadmium evaporates at 700&degC from cadmium based solid solutions resulting in formation of a porous tantalum with a highly developed surface. The prepared tantalum-based materials assume the technological application of the investigation results.\",\"PeriodicalId\":66816,\"journal\":{\"name\":\"纳米科学与工程(英文)\",\"volume\":\"167 1\",\"pages\":\"51-57\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-04-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"纳米科学与工程(英文)\",\"FirstCategoryId\":\"1089\",\"ListUrlMain\":\"https://doi.org/10.4236/WJNSE.2016.62006\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"纳米科学与工程(英文)","FirstCategoryId":"1089","ListUrlMain":"https://doi.org/10.4236/WJNSE.2016.62006","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

采用离子等离子溅射和超细Ta和Cd颗粒在移动衬底上共沉积的方法制备了固溶体，特别是制备了高达66.2 at的合金。% Cd以涂层的形式存在。在真空热处理中，镉在700°c时从镉基固溶体中蒸发，形成具有高度发达表面的多孔钽。制备的钽基材料承担了研究成果的技术应用。

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Technology of Porous Tantalum Production

Ion-plasma sputtering and codeposition of ultrafine Ta and Cd particles on a moving substrate were used to prepare the solid solutions, in particular, the alloys with up to 66.2 at.% Cd in the form of coatings. In vacuum heat treatment cadmium evaporates at 700°C from cadmium based solid solutions resulting in formation of a porous tantalum with a highly developed surface. The prepared tantalum-based materials assume the technological application of the investigation results.

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来源期刊

纳米科学与工程(英文)

自引率

0.00%

发文量

103