高纯锗晶体取向的光学方法

结晶过程及技术期刊(英文) Pub Date : 2013-04-30 DOI:10.4236/JCPT.2013.32009

Guojian Wang, Yongchen Sun, Y. Guan, D. Mei, Gang Yang, A. A. Chiller, Bruce Gray

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引用次数: 9

摘要

采用晶体面反射和蚀刻凹坑反射两种光学方法对高纯度锗晶体进行定向。用x射线衍射仪测量了从取向和晶体上切下的三个薄片的x射线衍射图。晶体面反射法和蚀刻坑反射法的实验误差在0.05°~ 0.12°之间。晶体面反射法和蚀刻坑反射法是一种非常简单和廉价的方法，它们的精度对于表征高纯度探测级锗晶体是可以接受的。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Optical Methods in Orientation of High-Purity Germanium Crystal

Two optical methods, namely crystal facet reflection and etching pits reflection, were used to orient and high-purity germanium crystals. The X-ray diffraction patterns of three slices that were cut from the oriented and crystals were measured by X-ray diffraction. The experimental errors of crystal facet reflection method and etching pits reflection method are in the range of 0.05° - 0.12°. The crystal facet reflection method and etching pits reflection method are extremely simple and cheap and their accuracies are acceptable for characterizing high purity detector-grade germanium crystals.

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结晶过程及技术期刊(英文)

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