{"title":"用于亚10nm图案定义的氦离子束光刻技术","authors":"S. Boden, Xiaoqing Shi","doi":"10.1117/2.1201702.006839","DOIUrl":null,"url":null,"abstract":"An emerging lithographic technique offers a promising alternative to electron beam lithography for fabricating new semiconductor devices with both traditional and non-traditional resists.","PeriodicalId":22075,"journal":{"name":"Spie Newsroom","volume":"185 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2017-05-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Helium ion beam lithography for sub-10nm pattern definition\",\"authors\":\"S. Boden, Xiaoqing Shi\",\"doi\":\"10.1117/2.1201702.006839\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An emerging lithographic technique offers a promising alternative to electron beam lithography for fabricating new semiconductor devices with both traditional and non-traditional resists.\",\"PeriodicalId\":22075,\"journal\":{\"name\":\"Spie Newsroom\",\"volume\":\"185 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-05-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Spie Newsroom\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/2.1201702.006839\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Spie Newsroom","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/2.1201702.006839","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Helium ion beam lithography for sub-10nm pattern definition
An emerging lithographic technique offers a promising alternative to electron beam lithography for fabricating new semiconductor devices with both traditional and non-traditional resists.
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