氧化过程中外延CoSi2层对下伏Si中B和Sb扩散的影响

{"title":"氧化过程中外延CoSi2层对下伏Si中B和Sb扩散的影响","authors":"A. Tyagi, U. Breuer, H. Holzbrecher, J. Becker, H. Dietze, L. Kappius, H. Bay, S. Mantl","doi":"10.1007/S002160051489","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":12375,"journal":{"name":"Fresenius' Journal of Analytical Chemistry","volume":"66 1","pages":"282-285"},"PeriodicalIF":0.0000,"publicationDate":"1999-09-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"The influence of an epitaxial CoSi2 layer on diffusion of B and Sb in underlying Si during oxidation\",\"authors\":\"A. Tyagi, U. Breuer, H. Holzbrecher, J. Becker, H. Dietze, L. Kappius, H. Bay, S. Mantl\",\"doi\":\"10.1007/S002160051489\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":12375,\"journal\":{\"name\":\"Fresenius' Journal of Analytical Chemistry\",\"volume\":\"66 1\",\"pages\":\"282-285\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-09-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Fresenius' Journal of Analytical Chemistry\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1007/S002160051489\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Fresenius' Journal of Analytical Chemistry","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1007/S002160051489","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}