二氟化硼掺杂的聚甲基丙烯酸甲酯中记录全息图的特性

A.Yu. Zhizhchenko, O.B. Vitrik, Yu.N. Kulchin
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引用次数: 0

摘要

研究了二氟化硼掺杂的聚甲基丙烯酸甲酯中全息光栅的形成。结果表明,记录全息光栅的折射率(RI)调制幅度的时间依赖性表现为m型特征,这种依赖性的第一个(高达0.5 × 10−4 RI单位)和第二个(高达0.2 × 10−4 RI单位)的最大值是由光二聚性和光活性添加剂分子的曝光后扩散引起的。结果表明,通过扩散和光化学过程的竞争,材料的分辨率约为1000线/mm。然而,由于扩散,该值在记录过程结束后随着时间的推移而增加,达到2500行/毫米。结果表明,最佳曝光时间与光栅空间频率成反比,材料从25°C加热到75°C可使曝光时间降低一个数量级以上。
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Features of recording holograms in polymethylmethacrylate doped by boron difluoride anthraceneacetonates

Holographic gratings formation in polymethylmethacrylate doped with boron difluoride anthraceneacetonates was studied. It was shown, that the time dependence of refractive index (RI) modulation amplitude for recorded holographic gratings demonstrates M-shaped character, with the first (up to 0.5 × 10−4 RI units) and the second (up to 0.2 × 10−4 RI units) maxima of this dependence being caused by photodimerizability and postexposure diffusion of photoactive additive molecules. It was found that the material's resolution determined by competition of diffusion and photochemical processes for recorded gratings is about 1000 lines/mm. However, due to diffusion this value raises with time after the recording process end reaching 2500 lines/mm. It was shown that the optimal exposure time is inversely proportional to the grating spatial frequency and can be reduced by more than an order of magnitude by material heating from 25 °C to 75 °C.

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