近空间蒸发法制备CuInSe2薄膜及其表征

K.R. Murali, S.K. Viswanathan, B.S.V. Gopalam
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引用次数: 2

摘要

利用蒸发技术在云母衬底上制备了CuInSe2薄膜,蒸发技术涉及改变源与衬底之间的距离。在距离源小于1cm处蒸发的薄膜在(112)方向上表现出优先取向。随着源基材距离从3 cm减小到1 cm,晶粒尺寸从0.5 μ m增大到1.0 μ m。电导率随源与衬底之间距离的减小而增大。电子探针微分析表明,在远离源的基底上涂覆的薄膜有轻微的硒缺乏和过量的铟。通过对光吸收光谱的分析,得到了1.01、1.25和2.4 eV三个特征能隙。价带到导带跃迁的光学跃迁概率估计为10.91 eV,这使得铜d态在价带的混合率为32%。
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Growth and characterization of CuInSe2 films by close-space evaporation

CuInSe2 thin films were prepared on mica substrates using an evaporation technique which involved varying the distance between the source and the substrate. Films evaporated on substrates at distances less than 1 cm from the source exhibited preferential orientation in the (112) direction. The grain size increased from 0.5 to 1.0 μ m as the source substrate distance decreased from 3 to 1 cm. The conductivity increased with a decrease in the distance between the source and substrate. Electron probe microanalysis of these films showed that films coated on substrates farther away from the source had a slight selenium deficiency and an excess of indium. Three characteristic energy gaps of 1.01, 1.25 and 2.4 eV were obtained from an analysis of the optical absorption spectrum. The optical transition probability for valence band to conduction band transitions was estimated to be 10.91 eV which gives an admixture of copper d states to the valence band of 32%.

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