{"title":"专利法、适格性与外部研发:经验证据","authors":"Yun Hou, I. Png, X. Xiong","doi":"10.2139/ssrn.3029106","DOIUrl":null,"url":null,"abstract":"Theoretically, whether technology firms should increase external R&D in response to stronger patent law depends on the effects of law on returns to external and internal R&D. Exploiting geographical differences in the strengthening of patent protection due to the U.S. Court of Appeals for the Federal Circuit, we find that, on average, external R&D increased by 42.3 percent. The effect was more pronounced among companies less intensive in manufacturing, smaller in scope, and in complex-technology and more geographically concentrated industries, and those where patents were less effective in appropriability.","PeriodicalId":11837,"journal":{"name":"ERN: Other IO: Empirical Studies of Firms & Markets (Topic)","volume":"19 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2020-08-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Patent Law, Appropriability, and External R&D: Empirical Evidence\",\"authors\":\"Yun Hou, I. Png, X. Xiong\",\"doi\":\"10.2139/ssrn.3029106\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Theoretically, whether technology firms should increase external R&D in response to stronger patent law depends on the effects of law on returns to external and internal R&D. Exploiting geographical differences in the strengthening of patent protection due to the U.S. Court of Appeals for the Federal Circuit, we find that, on average, external R&D increased by 42.3 percent. The effect was more pronounced among companies less intensive in manufacturing, smaller in scope, and in complex-technology and more geographically concentrated industries, and those where patents were less effective in appropriability.\",\"PeriodicalId\":11837,\"journal\":{\"name\":\"ERN: Other IO: Empirical Studies of Firms & Markets (Topic)\",\"volume\":\"19 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-08-30\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ERN: Other IO: Empirical Studies of Firms & Markets (Topic)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.2139/ssrn.3029106\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ERN: Other IO: Empirical Studies of Firms & Markets (Topic)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2139/ssrn.3029106","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Patent Law, Appropriability, and External R&D: Empirical Evidence
Theoretically, whether technology firms should increase external R&D in response to stronger patent law depends on the effects of law on returns to external and internal R&D. Exploiting geographical differences in the strengthening of patent protection due to the U.S. Court of Appeals for the Federal Circuit, we find that, on average, external R&D increased by 42.3 percent. The effect was more pronounced among companies less intensive in manufacturing, smaller in scope, and in complex-technology and more geographically concentrated industries, and those where patents were less effective in appropriability.