{"title":"“透镜内分光计”电压测量中的局部场效应分析","authors":"B. Wolf, J. Zach, H. Rose","doi":"10.1088/0022-3735/22/9/008","DOIUrl":null,"url":null,"abstract":"Voltage measurements in integrated circuits are often performed with an electron probe, in which case the measurement accuracy is limited by the so-called 'local field effects' (LFE). By performing ray tracing for the secondary electrons, the sensitivity of 'in-lens detection' to LFE has been analysed. A promising mode of operation was found for low extraction-field strengths (e.g. 40 V mm-1). By combining such an extraction field with a suitable objective-lens field the most crucial measurement error resulting from the LFE can be compensated. This method can also be applied, at least in principle, for the inspection of submicrometre devices. The results are compared with experimental measurements, some differences are discussed in detail.","PeriodicalId":16791,"journal":{"name":"Journal of Physics E: Scientific Instruments","volume":"43 1","pages":"720-725"},"PeriodicalIF":0.0000,"publicationDate":"1989-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Analysis of the local field effects on voltage measurements with an 'in-lens spectrometer'\",\"authors\":\"B. Wolf, J. Zach, H. Rose\",\"doi\":\"10.1088/0022-3735/22/9/008\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Voltage measurements in integrated circuits are often performed with an electron probe, in which case the measurement accuracy is limited by the so-called 'local field effects' (LFE). By performing ray tracing for the secondary electrons, the sensitivity of 'in-lens detection' to LFE has been analysed. A promising mode of operation was found for low extraction-field strengths (e.g. 40 V mm-1). By combining such an extraction field with a suitable objective-lens field the most crucial measurement error resulting from the LFE can be compensated. This method can also be applied, at least in principle, for the inspection of submicrometre devices. The results are compared with experimental measurements, some differences are discussed in detail.\",\"PeriodicalId\":16791,\"journal\":{\"name\":\"Journal of Physics E: Scientific Instruments\",\"volume\":\"43 1\",\"pages\":\"720-725\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1989-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Physics E: Scientific Instruments\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/0022-3735/22/9/008\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Physics E: Scientific Instruments","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/0022-3735/22/9/008","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
摘要
集成电路中的电压测量通常使用电子探针进行,在这种情况下,测量精度受到所谓的“局部场效应”(LFE)的限制。通过对二次电子进行射线追踪,分析了“透镜内探测”对LFE的灵敏度。低萃取场强度(例如40 V mm-1)的操作模式很有前途。通过将这样的提取场与合适的物镜场相结合,可以补偿由LFE引起的最关键的测量误差。至少在原则上,这种方法也可以应用于亚微米器件的检查。结果与实验测量值进行了比较,并详细讨论了差异。
Analysis of the local field effects on voltage measurements with an 'in-lens spectrometer'
Voltage measurements in integrated circuits are often performed with an electron probe, in which case the measurement accuracy is limited by the so-called 'local field effects' (LFE). By performing ray tracing for the secondary electrons, the sensitivity of 'in-lens detection' to LFE has been analysed. A promising mode of operation was found for low extraction-field strengths (e.g. 40 V mm-1). By combining such an extraction field with a suitable objective-lens field the most crucial measurement error resulting from the LFE can be compensated. This method can also be applied, at least in principle, for the inspection of submicrometre devices. The results are compared with experimental measurements, some differences are discussed in detail.