光致发光对多孔氮化镓激发发射增强的评价

M. K. Alquran
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引用次数: 1

摘要

摘要:本研究旨在研究不同电流密度下光电化学蚀刻制备的多孔氮化镓纳米结构的光学性能。利用光致发光(PL)光谱研究了不同样品的光学性质变化。在5mA/cm2蚀刻下,生长样品的峰值能量为3.40 eV,而在10ma /cm2蚀刻样品的峰值能量为3.41 eV, 20mA/cm2蚀刻样品的峰值能量为3.42 eV。此外,蓝宝石衬底在1.7 eV峰处也有另一个发射峰。多孔样品的PL峰强度随孔隙度的增加而增加,而在5 ma /cm2和10mA/cm2时,近带边峰的FWHM比未蚀刻的样品减小,表明孔径随蚀刻电流密度和孔隙度的增加而减小。最后,研究了多孔GaN纳米结构的折射率随孔隙率的变化。
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Assessment of the Enhancement for the Excitation Emission in Porous Gan using Photoluminescence
ABSTRACT: This work aims to assess the enhancement of optical properties for porous GaN nanostructures, which fabricated by Photoelectrochemical etching under different current densities. The changing of optical properties for different samples were investigated by Photoluminescence (PL) spectroscopy. A strong near band-gap-edge emission (NBE) was detected with peak energy 3.40 eV for as-grown and sample etched at 5mA/cm2, while its 3.41 and 3.42 eV for samples etched with 10 and 20mA/cm2 respectively. Also, another peak emission from the sapphire substrate at peak 1.7 eV was observed. The PL peak intensity of the porous samples have increased with increasing the porosity, while the FWHM of the near-band-edge peak was decreased in 5 and 10mA/cm2 samples compared to as-grown non-etched sample, indicated that the pore size decreased with etching current density and porosity. Finally, the change of refractive with porosity was investigated in the porous GaN nanostructure.
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