P. Wachulak, M. Marconi, W. Rockward, D. Hill, E. Anderson, C. Menoni, J. Rocca
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Extreme ultraviolet interferometric lithography with a desk-top system
We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub-100 nm feature size.
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