低密度烧结金属制品的等离子体渗氮机理

IF 0.3 Q4 THERMODYNAMICS HTM-Journal of Heat Treatment and Materials Pub Date : 2021-02-01 DOI:10.1515/htm-2020-0004
E. Rolinski, M. Woods
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引用次数: 0

摘要

等离子体氮化的机理包括各种活性物质的形成,产生与金属反应的氮原子。哪些菌种在供应氮方面占优势取决于氮化条件以及处理过的金属的性质。低密度粉末金属(PM)产品的等离子体氮化导致层的形成,其厚度可能取决于用于该过程的气体压力。较高的压力可以使等离子体产生的氨化合物形成的活性氮在局部更深地穿透表面。而较低的加工压力可显著降低这种影响。局部较厚层的形成机制依赖于表面开放孔隙的存在,因为它们可以被等离子体产生的氨物质穿透。同样的孔隙不能被同时形成的氮离子穿透,因为它们的平均自由寿命比氨离子短得多。◼
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Plasma Nitriding Mechanisms of Low-Density Sintered Metal Products
Abstract The mechanism of plasma nitriding include the formation of various active species generating nitrogen atoms reacting with the metal. Which species prevail in supplying nitrogen depends on nitriding conditions as well as the nature of the treated metal. Plasma nitriding of low-density powder metal (PM) products results in a formation of the layers whose thicknesses may depend on the gas pressure used for the process. Higher pressure can cause locally deeper penetration of the surface by active nitrogen species formed from ammonia compounds generated by the plasma. While a low processing pressure reduces this effect significantly. The formation mechanism of a locally thicker layer relies on the presence of open porosities in the surface as they can be penetrated by the ammonia species generated by the plasma. The same porosities cannot be penetrated by the ions of nitrogen formed at the same time since their mean free life is much shorter than that of ammonia species. ◼
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CiteScore
1.50
自引率
33.30%
发文量
43
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